Formation of metastable excited Ti and Ni atoms during ion sputtering

Nicolussi, G. K.; Husinsky, W.; Gruber, Dieter; Betz, G.

doi:10.1103/physrevb.51.8779

Cited by 29 publications

(21 citation statements)

References 33 publications

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“…We should emphasize that in this reasoning we have assumed that the ionization rate of the metal was low enough to neglect both the contribution of Cu + ions to the deposition rate on the substrate and the loss of Cu atoms to the chamber walls by ambipolar diffusion of Cu + ions. 46 . In magnetron discharges the energy of impinging ions is only a few hundreds of eV.…”

Section: -Conclusionmentioning

confidence: 99%

“…This fact must be accounted for when modeling the magnetron discharge or deducing the deposition rate of the metal from the measured density of ground state metal atoms. Regarding the propensity for the sputtered atom to be in the ground state, we should mention that in nickel atoms sputtered under 8 keV argon ion bombardments, the 46 . In magnetron discharges the energy of impinging ions is only a few hundreds of eV.…”

Section: -Conclusionmentioning

confidence: 99%

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Measured density of copper atoms in the ground and metastable states in argon magnetron discharge correlated with the deposition rate

Naghshara¹,

Sobhanian²,

Khorram³

et al. 2010

J. Phys. D: Appl. Phys.

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Abstract:In a dc-magnetron discharge with argon feed gas, densities of copper atoms in the ground state Cu( 2 S 1/2 ) and metastable state Cu*( 2 D 5/2 ) were measured by resonance absorption technique, using a commercial hollow cathode lamp as light source. The operating conditions were 0.3 -14 µbar argon pressure and 10 -200 W magnetron discharge power. The deposition rate of copper in a substrate positioned at 18 cm from the target was also measured with a quartz microbalance. The gas temperature, in the range of 300 to 380 K, was deduced from the emission spectral profile of N 2 (C 3 Π u − B 3 Π g ) 0-0 band at 337 nm when trace of nitrogen was added to the argon feed gas. The isotope-shifts and hyperfine structures of electronic states of Cu have been taken into account to deduce the emission and absorption line profiles, and hence for the determination of atoms densities from the measured absorption rates. To prevent error in evaluation of Cu density, attributed to the line profile distortion by autoabsorption inside the lamp, the lamp current was limited to 5 mA. Density of Cu( 2 S 1/2 ) atoms and deposition rate both increased with the enhanced magnetron discharge power but at fixed power the copper density augmented with argon pressure whereas the deposition rate followed the opposite trend. Whatever the gas pressure, the density of Cu*( 2 D 5/2 ) metastable atoms remained below the detection limit of 1 x 10 10 cm -3 for magnetron discharge powers below 50 W and hence increased much rapidly than the density of Cu( 2 S 1/2 ) atoms, over passing this later at some discharge power, whose value decreases with increasing argon pressure. This behavior is believed to result from the enhancement of plasma density with increasing discharge power and argon pressure, which would increase the excitation rate of copper into metastable states. At fixed pressure, the deposition rate followed the same trend than the total density of copper atoms in the ground and metastable states. Two important conclusions of this work are: i) copper atoms sputtered from the target under ion bombardment are almost all in the ground state Cu( 2 S 1/2 ) and hence in the plasma volume they can be excited into the metastable states; ii) all atoms in the long-lived ground and metastable states contributes to the deposition of copper layer on the substrate.a Corresponding author ; E-mail : nader.sadeghi@ujf-grenoble.fr 2 1-IntroductionMagnetron discharges are widely used for thin film deposition in surface treatment 1, 2 , magnetic and superconducting devices 3 , semiconductor industry 4 and in surface coating engineering of materials under low temperature conditions 5,6 . In these systems, the magnetic field, usually produced by placing permanent magnets behind the cathode, confines the plasma in the near cathode region, reducing the electron loss to the sidewalls. By increasing the ionization rate near the cathode, which is also the target to be sputtered, its confinement helps to maintain the plasma at much lower buffer gas pressure than...

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Section: -Conclusionmentioning

confidence: 99%

Section: -Conclusionmentioning

confidence: 99%

Measured density of copper atoms in the ground and metastable states in argon magnetron discharge correlated with the deposition rate

Naghshara¹,

Sobhanian²,

Khorram³

et al. 2010

J. Phys. D: Appl. Phys.

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“…RMPI can perform state-selective detection of desorbed species, and can detect almost any ground or metastable excited state atoms [18]. RMPI has been used to study the population and kinetic energy distribution of In [18,19], Rh [20,21], Ti [22], Ni [23][24][25][26], Co [23] and Ag [27,28]. A review of these studies has been made by Garrison et al [29].…”

Section: Introductionmentioning

confidence: 99%

Deexcitation of sputtered metastable aluminum atoms

Tan

King

2006

Surface Science

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“…Generally the aforementioned techniques are not species-specific while techniques such as mass spectrometry 13 and Rutherford backscattering [14][15] do allow species-specific measurements. Additionally, optical techniques such as optical emission spectroscopy [16][17] , laser induced fluorescence [18][19][20] , and multi-photon ionization coupled to a time of flight mass spectrometer [21][22][23] have been used for (species-specific) sputtering measurements. The use of LIF has been particularly extensive, and has proven to be very effective for velocity measurement though challenging for quantitative number density.…”

Section: Introductionmentioning

confidence: 99%

Species-Specific Sputtering Measurements with Cavity Ring-Down Spectroscopy (Preprint)

Surla¹,

Tao²,

Yalin³

2007

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Public reporting burden for this collection of information is estimated to average 1 hour per response, including the time for reviewing instructions, searching existing data sources, gathering and maintaining the data needed, and completing and reviewing this collection of information. Send comments regarding this burden estimate or any other aspect of this collection of information, including suggestions for reducing this burden to Department of Defense, Washington Headquarters Services, Directorate for Information Operations and Reports (0704-0188), 1215 Jefferson Davis Highway, Suite 1204, Arlington, VA 22202-4302. Respondents should be aware that notwithstanding any other provision of law, no person shall be subject to any penalty for failing to comply with a collection of information if it does not display a currently valid OMB control number. PLEASE DO NOT RETURN YOUR FORM TO THE ABOVE ADDRESS. REPORT DATE (DD-MM-YYYY)2. REPORT TYPE 3. DATES COVERED (From -To) Edwards AFB CA 93524-7013 SPONSORING / MONITORING AGENCY NAME(S) AND ADDRESS(ES) 10. SPONSOR/MONITOR'S ACRONYM(S) Air Force Research Laboratory (AFMC) AFRL/PRS SPONSOR/MONITOR'S Pollux Drive NUMBER(S) Edwards AFB CA 93524-7048 AFRL-PR-ED-TP-2007-275 DISTRIBUTION / AVAILABILITY STATEMENTApproved for public release; distribution unlimited (PA #07231A) SUPPLEMENTARY NOTESFor presentation at the 43 rd AIAA/ASME/SAE/ASEE Joint Propulsion Conference, Cincinnati, OH, 8-11 July 2007. ABSTRACTWe report sputtering studies using cavity ring-down spectroscopy (CRDS). The high sensitivity of the technique and its non-intrusive nature make it amenable to both in situ device studies as well as basic characterization studies. We provide demonstrative measurements of sputtered particles showing the ability to determine species-specific number density and velocity. We summarize a spatial-scanning approach for differential sputter yield measurements and give a measurement example based on a tantalum target. We discuss the use of CRDS for measurement of multi-component materials and provide experimental results for detection of a Fe-Mn target as well as a proposed detection scheme for boron nitride.

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Formation of metastable excited Ti and Ni atoms during ion sputtering

Cited by 29 publications

References 33 publications

Measured density of copper atoms in the ground and metastable states in argon magnetron discharge correlated with the deposition rate

Measured density of copper atoms in the ground and metastable states in argon magnetron discharge correlated with the deposition rate

Deexcitation of sputtered metastable aluminum atoms

Species-Specific Sputtering Measurements with Cavity Ring-Down Spectroscopy (Preprint)

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