Abstract:We propose a low-temperature nickel silicidation with a dopant segregation approach to form shallow anode profiles in thin wafer insulated-gate bipolar transistors (IGBTs). The process provides an anode with a boron peak concentration of 3 × 10 19 /cm 3 after annealing at 400°C. The silicidation results in a NiSi phase with a strong interface roughness, independent of the polishing process after grinding. The devices exhibit characteristics comparable with the state-of-the-art IGBTs in terms of voltage drop (V… Show more
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.