2006
DOI: 10.1016/j.tsf.2005.07.173
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Formation of highly moisture-resistive SiNx films on Si substrate by Cat-CVD at room temperature

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Cited by 7 publications
(10 citation statements)
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“…11-Azido-1-undecanol was synthesized from 11-bromo-1-undecanol and sodium azide according to the literature. 81 4,4,5,5,6,6,7,7,8,8,9,9, was purchased from Sigma-Aldrich. Alexa Fluor 555 azide (9) and the fluorescent labeled lectin Alexa Fluor 647 conjugate of PNA from Arachis hypogaea (peanut) were supplied by Invitrogen.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…11-Azido-1-undecanol was synthesized from 11-bromo-1-undecanol and sodium azide according to the literature. 81 4,4,5,5,6,6,7,7,8,8,9,9, was purchased from Sigma-Aldrich. Alexa Fluor 555 azide (9) and the fluorescent labeled lectin Alexa Fluor 647 conjugate of PNA from Arachis hypogaea (peanut) were supplied by Invitrogen.…”
Section: Methodsmentioning
confidence: 99%
“…2,3 Silicon nitride coatings are also a resistant barrier to diffusion of sodium ions and moisture. 4 Therefore, this ceramic is commonly deposited in the microelectronic industry as a passivation layer in, for instance, integrated circuits and solar cells. 5−7 On the other hand, being not only an insulator, but also a material with excellent biocompatibility, Si 3 N 4 has received considerable attention in biosensing 8,9 and medical applications.…”
Section: Introductionmentioning
confidence: 99%
“…In a pulsed SiH 4 -NH 3 -N 2 plasma, a decrease in the refractive index with a reduction in the duty ratio was observed at most bias powers [9]. A decreased refractive index at lower temperatures was also reported as *Corresponding author: kbwhan@sejong.ac.kr ©KIM and Springer well as and a slightly increased deposition rate [10]. Meanwhile, SiN film with less hydrogen was deposited at room-temperature [11,12].…”
Section: Introductionmentioning
confidence: 99%
“…For fabrications of silicon nitride, silicon carbon nitride and n-type nanocrystalline silicon carbide thin films, ammonia [1][2][3] and hexamethyldisilazane [4,5] are used as a N source. Ammonia is also used for nitriding of Si-wafer surface [6].…”
Section: Introductionmentioning
confidence: 99%