2013
DOI: 10.1016/j.displa.2013.08.008
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Formation of high-purity organic thin films by gas flow deposition and the effect of impurities on device characteristics

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Cited by 11 publications
(8 citation statements)
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“…[204] Tsugita et al fabricated high purity organic films via gas flow deposition method (GFD). [205] According to Jain et al, [206] Salati et al, [207] and Pardo et al [208] recrystallization and vacuum deposition are efficient methods to purify both organometallic and organic compounds used in OLEDs.…”
Section: Presence Of Impuritiesmentioning
confidence: 99%
“…[204] Tsugita et al fabricated high purity organic films via gas flow deposition method (GFD). [205] According to Jain et al, [206] Salati et al, [207] and Pardo et al [208] recrystallization and vacuum deposition are efficient methods to purify both organometallic and organic compounds used in OLEDs.…”
Section: Presence Of Impuritiesmentioning
confidence: 99%
“…Furthermore, these essentially linear sources [27] are scalable to larger sizes, figure 3. Such systems have been shown to produce films of similar morphology and electro-optical properties to those produced by conventional thermal evaporation and are adaptable for OTFT production [28]. This is exemplified by the fabrication of pentacene devices exhibiting a hole mobility of 1.5 cm 2 V −1 s −1 [29,30] using, for example, the showerhead arrangement developed at IMEC [30] and shown in figure 4.…”
Section: Underpinning Researchmentioning
confidence: 99%
“…50,51) Systems for rapid deposition of active layers in organic light emitting diodes using organic vapour phase deposition (OVPD) are also well-advanced. 52) Furthermore, OVPD has been used for OFET production 53) and may be combined with highresolution masks for patterning structures 54) or, alternatively, a small-diameter vapour jet used for local deposition of the semiconductor.…”
Section: R2r Processingmentioning
confidence: 99%