2023
DOI: 10.1016/j.nimb.2023.02.019
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Formation of crystalline Si1-xGex top layers by ion implantation in crystalline silicon

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Cited by 1 publication
(2 citation statements)
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“…25−28 The most commonly used approaches for fabricating SiGe nanocrystals on an insulator are chemical vapor deposition (CVD) and ion implantation. 29 Chemical vapor deposition is a thin-film deposition technique that can be used to grow SiGe nanocrystals on an insulator by controlling the atomic composition of the materials deposited by injecting SiH 4 and GeH 4 precursors into the CVD reactor. The precursors react chemically at high temperatures on the insulator surface.…”
Section: ■ Introductionmentioning
confidence: 99%
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“…25−28 The most commonly used approaches for fabricating SiGe nanocrystals on an insulator are chemical vapor deposition (CVD) and ion implantation. 29 Chemical vapor deposition is a thin-film deposition technique that can be used to grow SiGe nanocrystals on an insulator by controlling the atomic composition of the materials deposited by injecting SiH 4 and GeH 4 precursors into the CVD reactor. The precursors react chemically at high temperatures on the insulator surface.…”
Section: ■ Introductionmentioning
confidence: 99%
“…There are different methods for growing SiGe nanocrystals, each offering specific advantages in terms of controlling the composition, size, shape, and distribution of the nanocrystals. Each of these methods has advantages and limitations, depending on the specific application requirements. The most commonly used approaches for fabricating SiGe nanocrystals on an insulator are chemical vapor deposition (CVD) and ion implantation . Chemical vapor deposition is a thin-film deposition technique that can be used to grow SiGe nanocrystals on an insulator by controlling the atomic composition of the materials deposited by injecting SiH 4 and GeH 4 precursors into the CVD reactor.…”
Section: Introductionmentioning
confidence: 99%