Formation of Crystalline Cadmium Selenide Nanowires

Abstract

Highly crystalline, continuous parallel arrays of CdSe nanowires have been generated through electrodeposition using photoresist templates. Easy soft imprint nanolithography (ESINL) was used to pattern a commercially available photoresist, Norland Optical Adhesive 60 (NOA 60), deposited onto the ITO substrates, prior to electrodeposition. Using the exposed ITO layer as an electrode, a thin film of CdSe was electrodeposited from an electrolyte containing CdCl2, SeO2, and HCl on the substrate, and the resist was subsequently removed in an alkaline developer solution. The resulting CdSe nanowires were 100 nm in thickness, 300–500 nm in width, and several centimeters in length. Imprinted templates were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), selected area electron diffraction (SAED), and energy-dispersive X-ray spectroscopy (EDX). The SEM analysis confirmed the formation of parallel arrays of nanowires unaffected by the resist lift-off, and the XRD results showed that the CdSe nanowires had a hexagonal structure and that the crystalline structure was unaffected by the photoresist removal.

Superhydrophobic Surfaces from Hierarchically Structured Wrinkled Polymers

“…A silicon master mold with 500 nm grating patterns, 1 μm pitch size, and aspect ratio (height to width of the lines) of 1 was used as master mold. A “hardened”, cross-linked polydimethylsiloxane elastomer (h-PDMS) mold was obtained by replica molding of the silicon master mold according to the method described previously. , Flat PHEMA films were then imprinted with the h-PDMS mold at 120 °C with pressure of 300 psi for 2 min using a Nanonex NX-2000 nanoimprinter.…”

Patterned Polymer Films via Reactive Silane Infusion-Induced Wrinkling

“…Molds consisting of “hardened”, cross-linked polydimethylsiloxane elastomer (h-PDMS) were fabricated using previously described methods , with slight modification. The h-PDMS was prepared by mixing and degassing a mixture of 1.7 g of (7–8% vinylmethylsiloxane)–(dimethylsiloxane) copolymer, 5 μL of a modulator (2,4,6,8-tetramethyl-2,4,6,8-tetravinylcyclotetrasiloxane), 9 μL of catalyst (platinum–divinyltetramethyldisiloxane complex in xylene), and 0.5 mL of (25–30% methylhydrosiloxane)–(dimethylsiloxane) copolymer.…”

Metal Chalcogenide Nanocrystalline Solid Thin Films

“…3. 60 Erenturk et al 61 deposited CdSe nanowires in the form of thin films onto the ITO substrates by electrodeposition from an electrolyte containing CdCl 2 , SeO 2 and HCl. The electrolyte solution was prepared by dissolving CdCl 2 and SeO 2 in deionized water.…”