Formation of aluminium thin films in the presence of oxygen and nickel

Barna, Á.; Barna, P.B.; Radnóczi, G.; Reicha, Fikry M.; Tóth, Lajos

doi:10.1002/pssa.2210550210

Cited by 49 publications

(8 citation statements)

References 33 publications

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“…While aluminum has the best optical properties, it unfortunately has a propensity to form oxides during the coating process (21). The oxides tend to dramatically degrade both the reflective properties of the coated film and the resulting performance metrics of the NSOM tip (22–25). In our opinion, the metal-coating step in fabricating NSOM probes represents the largest single barrier that must be overcome before carrying out quality NSOM measurements.…”

Section: Methodsmentioning

confidence: 99%

Near-Field Scanning Optical Microscopy for High-Resolution Membrane Studies

et al. 2012

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The desire to directly probe biological structures on the length scales that they exist has driven the steady development of various high-resolution microscopy techniques. Among these, optical microscopy and, in particular, fluorescence-based approaches continue to occupy dominant roles in biological studies given their favorable attributes. Fluorescence microscopy is both sensitive and specific, is generally noninvasive toward biological samples, has excellent temporal resolution for dynamic studies, and is relatively inexpensive. Light-based microscopies can also exploit a myriad of contrast mechanisms based on spectroscopic signatures, energy transfer, polarization, and lifetimes to further enhance the specificity or information content of a measurement. Historically, however, spatial resolution has been limited to approximately half the wavelength due to the diffraction of light. Near-field scanning optical microscopy (NSOM) is one of several optical approaches currently being developed that combines the favorable attributes of fluorescence microscopy with superior spatial resolution. NSOM is particularly well suited for studies of both model and biological membranes and application to these systems is discussed.

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Section: Methodsmentioning

confidence: 99%

Near-Field Scanning Optical Microscopy for High-Resolution Membrane Studies

et al. 2012

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“…A good overview is given by Barna and co-workers in a dedicated study on the growth of evaporated aluminum thin films in the presence of oxygen. [1][2][3][4][5][6] They discuss the influence of oxygen as an impurity and describe a change in the film texture together with a decrease in grain size as a function of an increasing oxygen pressure. Similar effects were demonstrated by the same research group during the growth of TiN thin films, 7 by Liu and Barmak for W, 8 by Mahieu et al for Cr, 9 and by Riedl et al for TiAlN.…”

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confidence: 99%

Impurity dominated thin film growth

Cougnon

Dulmaa

Dedoncker

et al. 2018

Applied Physics Letters

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Magnetron sputter deposition was applied to grow thin metal films in the presence of impurities. These impurities are ambient gas molecules and/or atoms from the residual gas present in the vacuum chamber. Seven materials were investigated: four single element metals (Al, Ag, Cu, and Cr), two widely applied alloys (Cu 55 Ni 45 and Ni 90 Cr 10), and one high entropy alloy (CoCrCuFeNi). The thin films were analyzed using X-ray diffraction to determine the domain size, the film texture, and the lattice parameter. The same trend for all studied materials is observed. When the ratio between the impurity and metal flux towards the substrate is low, the domain size is not affected by the presence of the impurities. In this regime, the incorporation of the impurities affects the lattice parameter. At high flux ratios, the change of the domain size can be described by a power law with the exponent equal to À1/2 for all studied materials. A kinetic Monte Carlo code is used to demonstrate this observed trend.

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“…By analogy with the growth phenomena in metal films, this is an indication of clean uninterrupted addition of condensing material by a 'step-flow' mechanism [9] as is also well known for MBE growth of semiconductors [19,20]. Use of oxidizing [8,21,22] or reducing gases may therefore be considered likely to influence this important aspect of growth by enhancing (or reducing) the presence of oxides on the steps [9]. …”

Section: Resultsmentioning

confidence: 99%

Nucleation and early stage growth of CdTe thin films deposited by close space sublimation

Major

Durose

2009

2009 34th IEEE Photovoltaic Specialists Conference (PVSC)

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The early stage growth mechanisms of sublimation-grown thin-film polycrystalline CdTe are evaluated by growth interrupts and ex-situ AFM for growth under 100 torr of inert gas. Development of island size, density and coverage demonstrates that growth proceeds via the process of island nucleation, island growth and density increase, followed by coalescence, channel formation and secondary nucleation. Addition of material to the islands occurs partly by the 'step-flow' mechanism. Application of the nucleation model to influence the growth of solar cell quality CdTe layers is demonstrated by the use of elevated gas pressures to increase grain size. The enhanced grain size is attributed to a reduction in nucleation density arising from a decrease in surface concentration of the deposited species.

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Formation of aluminium thin films in the presence of oxygen and nickel

Cited by 49 publications

References 33 publications

Near-Field Scanning Optical Microscopy for High-Resolution Membrane Studies

Near-Field Scanning Optical Microscopy for High-Resolution Membrane Studies

Impurity dominated thin film growth

Nucleation and early stage growth of CdTe thin films deposited by close space sublimation

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