Formation of alumina film using alloy catalyzers in catalytic chemical vapor deposition

Ogita, Yoh‐Ichiro; Saito, Naoyuki

doi:10.1016/j.tsf.2014.10.022

Cited by 5 publications

(5 citation statements)

References 28 publications

(31 reference statements)

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Thus, the development of methods for the formation of dense corundum ceramics both in the form of coatings as well as bulk compacts is a relevant and challenging task of ceramic technology. The known methods of the formation of Al 2 O 3based coatings are sol-gel method [1], chemical vapor deposition [2,3], pulsed laser deposition [4,5], and electrophoretic deposition (EPD) [6][7][8]. The slip casting is known as one of the ceramic methods for producing corundum ceramics [9].…”

Section: Introductionmentioning

confidence: 99%

Electrophoretic deposition of coatings and bulk compacts using magnesium-doped aluminum oxide nanopowders

2021

View full text Add to dashboard Cite

The electrophoretic deposition (EPD) of coatings and bulk compacts in a wide range of thicknesses (from 23 to 1800 μm) from stable suspensions of a magnesium-doped aluminum oxide nanopowder with subsequent sintering of samples into dense ceramics was studied. The initial nanopowder was obtained by the method of electric explosion of an Al-Mg alloy wire with a Mg content of 1.3 wt. %. The study of the dispersion composition, kinetics of deaggregation under the ultrasonic treatment and zeta potential in the nanopowder-based suspensions was carried out. It was shown that a nearly linear increase in the deposited mass and thickness of EPD deposits occurred at a constant voltage of 20 V and an average deposition current of approximately 40 μA when the deposition time was varied from 1 to 180 min. Drying of the coatings with a thickness of less than 35 μm led to the formation of a net of small cracks, while drying of the bulk compacts with a thickness of more than 1 mm occurred without cracking. The ceramic bulk sample with a thickness of 1.2 mm and the density of 98.7% TD was successfully obtained by sintering at 1650 °C for 4 h. It was characterized by a dense grain structure with an average grain size of 5 μm and the presence of a small number of closed pores less than 1 μm in size. Sintering of ceramics was revealed to be accompanied by the formation of a MgAl2O4 crystalline spinel phase, localized mainly at grain boundaries.

show abstract

Section: Introductionmentioning

confidence: 99%

Electrophoretic deposition of coatings and bulk compacts using magnesium-doped aluminum oxide nanopowders

2021

View full text Add to dashboard Cite

show abstract

“…Due to its unique properties such as high chemical inertness, refractory quality, high strength, and low electrical conductivity, alumina-based ceramics are used in a wide variety of high-technology areas of power engineering, mechanical engineering, electrotechnical industry, and instrumentation technology [1][2][3]. Alumina is used in the fabrication of thin-film coatings via pulsed laser deposition [4,5], chemical vapor deposition [6,7], and the sol-gel process [8]. Alumina powders are compacted using isostatic and magnetic pulse methods [9][10][11] and slip casting [12,13].…”

Section: Introductionmentioning

confidence: 99%

Formation of Bulk Alumina Ceramics by Electrophoretic Deposition from Nanoparticle Suspensions

Калинина

Rusakova

Kaigorodov

et al. 2021

Russ. J. Phys. Chem.

View full text Add to dashboard Cite

“…Trimethylaluminum (TMA) was also evaluated as a CVD precursor to form alumina films. In addition to an oxidizing agent, however, the process can require the use of a catalytic support (Ir, Ni‐Cr alloys) or plasma assistance, and otherwise employs deposition temperatures equal to, or higher than, those employed for ATI . These relatively high temperatures may limit the use of TMA‐ and ATI‐processed alumina films for the protection of materials for which the properties, e.g., mechanical, change significantly above 200–300 °C.…”

Section: Introductionmentioning

confidence: 99%

A Process‐Structure Investigation of Aluminum Oxide and Oxycarbide Thin Films prepared by Direct Liquid Injection CVD of Dimethylaluminum Isopropoxide (DMAI)

Baggetto

Charvillat

Esvan

et al. 2015

Chemical Vapor Deposition

View full text Add to dashboard Cite

We present the direct liquid injection CVD of aluminum oxide and oxycarbide thin films using dimethylaluminum isopropoxide at high process temperature (500-700 8C) with the addition of O 2 gas, and at low temperature (150-300 8C) with the addition of H 2 O vapor. Very smooth films with typical roughness values lower than 2 nm are obtained. The thin films are composed of an amorphous material. The composition evolves as a function of temperature from that of a partial hydroxide to a stoichiometric oxide at low deposition temperature (150-300 8C), and from that of a stoichiometric oxide to a mixture of an oxide with an (oxy) carbide at higher temperature (500-700 8C).

show abstract

Formation of alumina film using alloy catalyzers in catalytic chemical vapor deposition

Cited by 5 publications

References 28 publications

Electrophoretic deposition of coatings and bulk compacts using magnesium-doped aluminum oxide nanopowders

Electrophoretic deposition of coatings and bulk compacts using magnesium-doped aluminum oxide nanopowders

Formation of Bulk Alumina Ceramics by Electrophoretic Deposition from Nanoparticle Suspensions

A Process‐Structure Investigation of Aluminum Oxide and Oxycarbide Thin Films prepared by Direct Liquid Injection CVD of Dimethylaluminum Isopropoxide (DMAI)

Contact Info

Product

Resources

About