2015
DOI: 10.1007/s13204-015-0425-7
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Formation of Al-doped ZnO thin films on glass by sol–gel process and characterization

Abstract: In this study, pure ZnO and Al-doped ZnO thin films were developed on glass by sol-gel process followed by drying and annealing in air at 170 and 400°C, respectively. The surface morphology and structural characteristics were determined through scanning electron microscopy, atomic force microscopy and X-ray diffraction. The Fourier transform infrared spectroscopy validated the formation of Al-doped ZnO film on glass substrate. It was evaluated that 1 at% aluminum (Al) doping in ZnO film showed low electrical r… Show more

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Cited by 55 publications
(28 citation statements)
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References 22 publications
(23 reference statements)
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“…Among the electrical properties, the resistivity depends strongly on the condensation of the charges caused by the degree of substitution of the cobalt atoms by the cadmium atoms, as well as by the oxygen vacancies present in the crystal. 39 The variation of the resistance and capacities as a function of Cd-doping level are recapitulated in Table 4 and exposed in Fig. 7.…”
Section: Impedance Spectroscopymentioning
confidence: 99%
“…Among the electrical properties, the resistivity depends strongly on the condensation of the charges caused by the degree of substitution of the cobalt atoms by the cadmium atoms, as well as by the oxygen vacancies present in the crystal. 39 The variation of the resistance and capacities as a function of Cd-doping level are recapitulated in Table 4 and exposed in Fig. 7.…”
Section: Impedance Spectroscopymentioning
confidence: 99%
“…Tuzak seviyelerinin yakalama tesir kesiti =7.27x10 17 cm 2 olarak bulunmuştur. ZnO yapısına %2 Al katkılamanın yapının serbest elektron sayısını artırdığı ve direnci düşürdüğü bilinmektedir [21]. AZO/p-Si örneğinin DLTS sonuçlarından iletkenlik bandından 119 meV aşağıda elektron sevilerinin varlığı tespit edilmiştir.…”
Section: Materyal Ve Metotunclassified
“…An Nb film of 16 nm thickness is deposited on an S i 0 2 substrate for obtaining the desired arrays of antidots. The micro bridges and nanostructured array of antidots are, respectively, fabricated by photo-and e-beam lithography techniques on a resistive layer of polymethyl metacrystalline (Mostako and Alika 2012;Shahid et al 2016). Fabrication of the microbridges and array is followed by scanning of the samples to the desired antidots using scanning electron microscopy (SEM).…”
Section: Physical Measurement System and Readingsmentioning
confidence: 99%