Formation and properties of TiC thin films by pulsed Nd/YAG laser deposition

Suda, Yoshiaki; Kawasaki, Hiroharu; Doi, Katsuhiko; Hiraishi, Satoshi

doi:10.1016/s0040-6090(00)01166-4

Cited by 16 publications

(10 citation statements)

References 19 publications

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“…They show metallic as well as covalent and ionic properties, exhibiting a unique combination of characteristics that allow them to be serious candidates for a wide range of hightechnology applications [1][2][3][4][5][6]. Beyond these technological applications that can range from several examples in metallurgy, aeronautics, electronics and medicine, used to protect and to decrease wear in a variety of components, there is also the more specific case of fundamental research, where these carbides have been revealed to be a subject of great interest [7,8].…”

Section: Introductionmentioning

confidence: 99%

“…Beyond these technological applications that can range from several examples in metallurgy, aeronautics, electronics and medicine, used to protect and to decrease wear in a variety of components, there is also the more specific case of fundamental research, where these carbides have been revealed to be a subject of great interest [7,8]. The wide structural features revealed with, for instance, the variation of the C content, is one of the factor that is interesting for the research teams [1][2][3][4][5][6]. While exhibiting a number of unusual properties, most applications of the transition-metal carbides rely upon their extreme hardness, which are typically found for covalent crystals [9].…”

Section: Introductionmentioning

confidence: 99%

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The influence of structure changes in the properties of TiCxOy decorative thin films

et al. 2007

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The main purpose of this work consists in the preparation of titanium oxycarbide, TiC x O y , thin films, in which the presence of oxygen changed the film properties between those of titanium carbide and those of titanium oxide. Varying the oxide/carbide ratio allowed to tune the structure of the films between titanium oxide and carbide and consequently electronic, mechanical and optical properties of the films. The depositions were carried out from a TiC target by direct current, dc, reactive magnetron sputtering, varying the oxygen flow rate. The obtained results showed that the film's properties can be divided into 3 different regimes -i) carbide, ii) a transition zone and iii) an oxide one. X-ray diffraction results revealed the occurrence of a face-centered cubic phase (TiC-type) for low oxygen content, also obtained in the TiC 1.6 (O) film, with a clear tendency towards amorphization with the increase of the oxygen flow rate. For the highest oxygen contents, the results revealed the development of a mixture of poorly crystallized TiO 2 phases. The colour results indicated a strong dependence on the O/Ti ratio. A progressive reduction of hardness and residual stresses with the increase of the O/Ti ratio was also observed. The residual stresses, as well as the film structure, seem to play an important role on the adhesion of the coatings. The static friction coefficient revealed also some correlation with the mechanical properties, but mainly with the surface roughness.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

The influence of structure changes in the properties of TiCxOy decorative thin films

et al. 2007

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“…Due to these remarkable properties TiC films have been used as hard and protective coatings in many applications [4,5]. Thin TiC films have been successfully deposited using sputtering, e-beam evaporation, chemical vapor deposition (CVD), and pulsed laser deposition (PLD) techniques [6][7][8][9]. Previous studies showed that a good and clean vacuum, a high purity C containing atmosphere and a high laser fluence were necessary to obtain good quality TiC films using the PLD technique [10][11][12].…”

Section: Introductionmentioning

confidence: 99%

Hard TiC Films Grown by Pulsed Laser Deposition

Crǎciun

Popescu

Cristea

et al. 2015

Materials Today: Proceedings

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“…Several techniques have been used to deposit TiC thin films, including chemical vapor deposition (CVD) [2], plasma-enhanced CVD [3], laser CVD [4], ion-beam assisted deposition (IBAD) [5], plasma spraying [6], magnetron sputtering [7] and pulsed laser deposition (PLD) [8][9][10][11][12][13][14]. Among these methods, the latter process is particularly promising because of its simplicity, flexibility and capability to preserve the stoichiometry of the material [15].…”

Section: Introductionmentioning

confidence: 99%