Formation and Decay of Fluorobenzene Radical Anions Affected by Their Isomeric Structures and the Number of Fluorine Atoms

Higashino, Saki; Saeki, Akinori; Okamoto, Kazumasa; Tagawa, Seiichi; Kozawa, Takahiro

doi:10.1021/jp102828g

Cited by 25 publications

(27 citation statements)

References 73 publications

(31 reference statements)

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“…It seems quite natural to choose the reaction coordinate method with the C–Hal bond elongation as the coordinate when Hal − elimination is studied, and there are a lot of examples of such choice in literature. For instance, the method of reaction coordinate was used when the decay of fluorobenzene RAs was examined and the data on dissociative electron attachment to dichlorobenzene isomers were interpreted . We can suppose that in both cases authors failed to describe completely and unambiguously the regularities observed because a real reaction coordinate may be much more complicated than bond elongation alone.…”

Section: Monomolecular Fragmentation Of Radical Anions Of the Halogenmentioning

confidence: 99%

Potential energy surface as a key to understanding the structure and properties of short‐living radical ions of cyclic organic molecules

Shchegoleva

Beregovaya

2015

Int J of Quantum Chemistry

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The review proposed summarizes the results of investigations on the adiabatic potential energy surfaces (PESes) for the radical ions of some derivatives of highly symmetric organic molecules such as benzene and cyclohexane. The results obtained show that the main feature of the PESes of highly symmetric Jahn-Teller ions, namely conical intersection, may persist for their low-symmetric derivatives. Hence, their PESes have a pseudorotational shape resulting from the intersection avoidance. A distinctive feature of radical anions of fluorine containing aromatic compounds is the planar structure disturbance due to the vibronic coupling of the ground p and low-lying excited r states. The data on the PES structure including the positions and relative energies of its extrema, curvature in their vicinity, and stationary point interrelations provide the foundation for understanding the spectral properties and reactivity of radical ionic species. Examples of applying the PES study results to experimental data interpretation are given.

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Section: Monomolecular Fragmentation Of Radical Anions Of the Halogenmentioning

confidence: 99%

Potential energy surface as a key to understanding the structure and properties of short‐living radical ions of cyclic organic molecules

Shchegoleva

Beregovaya

2015

Int J of Quantum Chemistry

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“…[79][80][81] However, the development of high-absorption resists based on fluorinated polymers still requires further efforts, because the change in backbone polymers significantly affects acid generation, acid diffusion, catalytic chain reaction, and dissolution. 82,83) Recently, hafnium oxide resists have attracted much attention because of their high EUV absorption and etching resistance. 11,84) The hafnium oxide resist developed by Inpria showed 15 nm resolution (30 nm pitch) with 70 mJ cm À2 sensitivity.…”

Section: Absorption Enhancementmentioning

confidence: 99%

Resist Materials and Processes for Extreme Ultraviolet Lithography

Itani¹,

Kozawa

2012

Jpn. J. Appl. Phys.

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161

153

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Extreme ultraviolet (EUV) radiation, the wavelength of which is 13.5 nm, is the most promising exposure source for next-generation semiconductor lithography. The development of EUV lithography has been pursued on a worldwide scale. Over the past decade, the development of EUV lithography has significantly progressed and approached its realization. In this paper, the resist materials and processes among the key technologies of EUV lithography are reviewed. Owing to its intensive development, the resist technology has already closely approached the requirements for the 22 nm node. The focus of the development has shifted to the 16 nm node and beyond. Despite the trade-off relationships among resolution, line edge roughness/line width roughness, and sensitivity, the capability of resist technology will go beyond the 16 nm node.

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“…9−16 Pico-and nanosecond transient absorption measurements during pulse radiolysis provide kinetic and mechanistic information on formation and decay of the intermediates. 13,17,18 Mesolysis promoted by reductive electron transfer to a molecule AB with A and B groups linked by a σ-bond may be subjected to different mesolysis mechanisms. 5−7 One is the concerted mechanism where the electron attachment on AB occurs together with dissociation to A radical (A • ) and B anion (B − ).…”

Section: ■ Introductionmentioning

confidence: 99%

Mesolysis Mechanisms of Aromatic Thioether Radical Anions Studied by Pulse Radiolysis and DFT Calculations

et al. 2015

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The mesolysis mechanisms for eight aromatic thioether radical anions (ArCH2SAr'(•-)) generated during radiolysis in 2-methyltetrahydrofuran were studied by spectroscopic measurements and DFT calculation. Seven of ArCH2SAr'(•-) underwent mesolysis via dissociation of the σ-bond between the benzylic carbon and sulfur atoms, forming the corresponding radical and anion with the stepwise mechanism or concerted mechanism. Conversely, no mesolysis in the benzyl β-naphthyl sulfide radical anion was found. From the Arrhenius analysis of the mesolysis with the stepwise mechanism, apparent activation energies (ΔEexp) were determined and compared with those (ΔEcal) estimated by the DFT calculations. Two types of C-S bond dissociation are possible to give the C radical and S anion (ArCH2(•)/Ar'S(-)) and the C anion and S radical (ArCH2(-)/Ar'S(•)). The dissociation energies (BDE(ArCH2(•)/Ar'S(-)) and BDE(ArCH2(-)/Ar'S(•))) were estimated by the DFT calculations, and BDE(ArCH2(•)/Ar'S(-)) were found to be smaller than BDE(ArCH2(-)/Ar'S(•)). The formation of ArCH2(•)/Ar'S(-) was observed on the mesolysis of five ArCH2SAr'(•-), while one ArCH2SAr'(•-) provided ArCH2(-)/Ar'S(•). Chemical properties governing the mesolysis mechanisms of ArCH2SAr'(•-) are discussed.

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Formation and Decay of Fluorobenzene Radical Anions Affected by Their Isomeric Structures and the Number of Fluorine Atoms

Cited by 25 publications

References 73 publications

Potential energy surface as a key to understanding the structure and properties of short‐living radical ions of cyclic organic molecules

Potential energy surface as a key to understanding the structure and properties of short‐living radical ions of cyclic organic molecules

Resist Materials and Processes for Extreme Ultraviolet Lithography

Mesolysis Mechanisms of Aromatic Thioether Radical Anions Studied by Pulse Radiolysis and DFT Calculations

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