2004
DOI: 10.1016/j.msea.2004.03.054
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Formation and control of zinc nitride in a molten LiCl–KCl–Li3N system

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Cited by 14 publications
(12 citation statements)
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“…where, M represents so far, Ti, Zr, Fe, Al, Co, Cr, Ga, Zn and stainless steel [10][11][12][13][14][15][16]. In these experiments, however, Li 3 N was used as nitride ion source, which is difficult to handle under ambient atmosphere.…”
Section: Electrochemical Formation Of Nitridesmentioning
confidence: 99%
“…where, M represents so far, Ti, Zr, Fe, Al, Co, Cr, Ga, Zn and stainless steel [10][11][12][13][14][15][16]. In these experiments, however, Li 3 N was used as nitride ion source, which is difficult to handle under ambient atmosphere.…”
Section: Electrochemical Formation Of Nitridesmentioning
confidence: 99%
“…Examples of electrochemically synthesized thin films of iron nitrides in a molten salt system were already reported: ε ‐Fe 2–3 N/ γ ′‐Fe 4 N and ε ‐Fe 2 N 1– x / γ′ ‐Fe 4 N , . Next to electrochemically formed binary iron nitrides several thin layers of binary nitrides can be also synthesized with this method, such as AlN, GaN, InN, TiN, CrN/Cr 2 N, Co 3 N, Zn 3 N 2, , ZrN, and amorphous SnN x . All these mentioned nitrides were produced in a LiCl–KCl salt melt with Li 3 N as nitrogen reservoir.…”
Section: Introductionmentioning
confidence: 98%
“…Electrochemical synthesis as one alternative for bulk nitride production was nearly neglected so far, although providing advantages of lower synthesis temperatures and avoiding harmful gases. However, electrochemical synthesis was able to produce thin layers of several binary nitrides on the surfaces of electrodes, for example AlN, GaN, InN, TiN, CrN/Cr 2 N, Co 3 N, ε‐Fe 2 N 1–x /γ′‐Fe 4 N,, Zn 3 N 2, , ZrN, and amorphous SnN x . PXRD indicated the formation of the ternary nitride LiZnN as an impurity phase during synthesis of Zn 3 N 2 films …”
Section: Introductionmentioning
confidence: 99%