Foliar application of silicon sources and shading levels in Peltophorum dubium (Spreng.) Taub.

Abstract

Depending on the intensity and ecological successional classification of plants, light availability can become an unfavorable condition for producing high-quality seedlings. We hypothesized that applying silicon sources might contribute to inducing tolerance to different shading levels for Peltophorum dubium (Spreng.) Taub. seedlings. Two independent experiments were developed: I) the application of five doses of silicon oxide (SiO2: 0.0; 1.0; 2.0; 4.0; and 6.0 g L-1); and II) the application of five doses of potassium silicate (K2SiO3: 0.0; 5.0; 10.0; 15.0; and 20.0 mL L-1 of water). Both were associated with three shading levels: 0% (direct sunlight), 30%, and 50%. In experiment I, we observed that seedlings were more responsive to shading levels and had little influence from foliar application of SiO2, with higher growth, biomass, and quality values when grown under direct sunlight (0% shading). In experiment II, the foliar application of 20.0 mL L-1 of K2SiO3 contributed to greater heights under 0% and 30% shading. Meanwhile, under 50% shading, the dose of 5.0 K2SiO3 favored the species' growth. The application of K2SiO3 favored the increase in the dry mass of the aerial part (DMAP). The highest biomass production and seedling quality occurred under 0% and 30% shading. The 50% shaded environment was most unfavorable to the growth and quality of P. dubium seedlings. Even though the seedlings were not very responsive to silicon sources, K2SiO3 provided a greater response than SiO2. High-quality seedling production is favored when the seedlings are grown under direct sunlight (0% shading).