2012
DOI: 10.1038/nphoton.2012.306
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Focusing of X-ray free-electron laser pulses with reflective optics

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Cited by 254 publications
(158 citation statements)
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References 29 publications
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“…Serial femtosecond nanocrystallography [2][3][4][5] and imaging of individual proteins and viruses at atomic resolution call for higher intensity and shorter X-ray pulses [9][10][11][12][13][14][15] , which will allow an image to be acquired before radiation damage destroys the sample. Advances in X-ray focusing capabilities 16 and XFEL peak brightness 17 suggest that a regime of multiple photons absorbed per atom, with dramatic radiation damage occurring within the 10-100 fs X-ray pulse duration, is likely to be reached in the next few years. This regime is essential to achieve the goal of single-particle imaging at the ångström scale in samples lacking crystal structure to give rise to diffraction peaks.…”
mentioning
confidence: 99%
“…Serial femtosecond nanocrystallography [2][3][4][5] and imaging of individual proteins and viruses at atomic resolution call for higher intensity and shorter X-ray pulses [9][10][11][12][13][14][15] , which will allow an image to be acquired before radiation damage destroys the sample. Advances in X-ray focusing capabilities 16 and XFEL peak brightness 17 suggest that a regime of multiple photons absorbed per atom, with dramatic radiation damage occurring within the 10-100 fs X-ray pulse duration, is likely to be reached in the next few years. This regime is essential to achieve the goal of single-particle imaging at the ångström scale in samples lacking crystal structure to give rise to diffraction peaks.…”
mentioning
confidence: 99%
“…The membranes were mounted into the MAXIC installed at EH3 of SACLA. Individual XFEL pulses, set at 5.5 keV, were focussed to a size of B1.5 mm via the K-B mirrors 33 . RNAi microsponges randomly mounted on the membrane were exposed to XFEL pulses by scanning the focused X-ray beams across the membrane window.…”
Section: Methodsmentioning
confidence: 99%
“…The pulse energy was 100 mJ at the sample position, with o ± 7% variation in pulse energy based on the average of 30 pulses. The pulsed X-rays were focused by a pair of K-B mirrors to a 1.5-mm-diameter spot at the focal point, delivering B1.1 Â 10 11 photons in each pulse (B10 GW) 33 . Speckle patterns were obtained through single-shot exposures, now without the influence of radiation-induced distortions.…”
Section: Article Nature Communications | Doi: 101038/ncomms4798mentioning
confidence: 99%
“…Reducing the feature size of a microchip from 42 to 10 nm using the ultraviolet lithography technique requires that the key optical element of the lithography system needs a flatness of 2 nm across an area of 30 cm [10]. An advanced laser system demands high-quality microlens arrays to enhance the laser intensity [11][12][13][14]. The development of space telescopes calls for ultra-precision, large-scale glass lens to explore the universe [15][16][17][18].…”
Section: Introductionmentioning
confidence: 99%