We report results of the exposure of poly͑tetrafluoroethylene͒ -͑PTFE͒, poly͑methyl methacrylate͒ -͑PMMA͒, and polyimide -͑PI͒ to intense 46.9-nm-laser pulses of 1.2-ns-duration at fluences ranging from ϳ0.1 to ϳ10 J/cm 2 . The ablation rates were found to be similar for all three materials, ϳ80-90 nm/ pulse at 1 J / cm 2 . The results suggest that the ablation of organic polymers induced by intense extreme ultraviolet laser radiation differs from that corresponding to irradiation with longer wavelengths. © 2005 American Institute of Physics. ͓DOI: 10.1063/1.1854741͔ Ablation of organic polymers by optical radiation, in particular from excimer lasers, has been extensively studied. 1-3 However, polymer ablation induced by extreme ultraviolet ͑XUV͒ radiation with wavelength shorter than 100 nm is discussed in only a small number of publications. Poly ͑butene-1 sulphone͒, 4 PMMA, 5,6 poly ͑ethylene terephthalate͒, 7 and PTFE 5,8 were ablated by incoherent, nonmonochromatic XUV emission from laser-produced plasma. A Z-pinch plasma was used as an XUV source for ablation of PMMA 5 and PTFE. 5,9 Very recently PMMA was efficiently ablated by sub-100-fs pulses of 86-nm-radiation provided by a free-electron laser. 7,10 A large number of studies on direct photoetching of the organic polymers induced by XUV synchrotron radiation were also reported. 11-13 However, according to Haglund's criterion 14 this photoinduced material removal is closer to laser desorption than to laser ablation because of a low peak power of the photon beams delivered by a synchrotron radiation source.The recent advances in compact high repetition rate XUV lasers 15 producing nanosecond pulses of monochromatic radiation with energy of several hundred micro-Joules opens the possibility to study materials ablation in a new regime. In this letter, we report on the ablation behavior of three common organic polymers: PTFE, PMMA, and PI, irradiated with an intense focused 46.9-nm-laser beam. The ablation processes induced by nanosecond pulses of 46.9-nm-laser radiation are compared with those occurring in the polymer materials irradiated with conventional longer wavelength laser sources.The samples studied here were 1-mm-thick sheets ͑Goodfellow͒ cut into 2.0ϫ 5.0 mm 2 chips. The PTFE and PI samples were polished, while the PMMA was used directly with no additional treatment. The samples were placed into vacuum chamber where they were exposed to 1.2 ns FWHM pulses of 46.9 nm radiation from a capillary discharge Nelike Ar laser. 15 Laser pulses with energy of ϳ130 J were focused onto the sample surfaces by a spherical Sc/ Si multilayer-coated mirror 16 with measured reflectivity of ϳ30%. A motorized positioning system was used to translate the samples along the beam optical axis, as well as in the directions perpendicular to the beam. 17 The former motion allowed us to vary the irradiation fluence by controlling the laser spot diameter on the sample surface, while the pulse energy and duration were kept constant. Figure 1 shows an optical micrograph of a PM...