2009
DOI: 10.1063/1.3077158
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Focused patterning of nanoparticles by controlling electric field induced particle motion

Abstract: We report a general methodology for producing focused arrays of nanoparticles via electrodynamic focusing approach and controlling the inertial effect of charged aerosols. An important effect of particle inertia is identified and verified by performing detailed calculations of electric field induced particle motion and experimenting with electrosprayed nanoparticles. The controllability of focusing is demonstrated by changing the curvature of electric field lines.

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Cited by 25 publications
(22 citation statements)
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References 24 publications
(12 reference statements)
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“…Higher loadings however produce other possibilities, including the development in these mask sets of a transition to a conductive form of the b-PDMS. The latter could engender its own enabling opportunities within soft lithography (e.g., in microfluidics [55,76,77] and electrodynamical patterning [78][79][80] ). Second, there also comes in the context of filled forms of PDMS other opportunities for effecting interesting impacts within soft lithographic patterning; foremost among these www.afm-journal.de are possibly significant utilities for their application in grayscale and new forms of phase-contrast soft lithography.…”
Section: Discussionmentioning
confidence: 99%
“…Higher loadings however produce other possibilities, including the development in these mask sets of a transition to a conductive form of the b-PDMS. The latter could engender its own enabling opportunities within soft lithography (e.g., in microfluidics [55,76,77] and electrodynamical patterning [78][79][80] ). Second, there also comes in the context of filled forms of PDMS other opportunities for effecting interesting impacts within soft lithographic patterning; foremost among these www.afm-journal.de are possibly significant utilities for their application in grayscale and new forms of phase-contrast soft lithography.…”
Section: Discussionmentioning
confidence: 99%
“…Lee et al 91) showed that IAAL mediated circle patterns of charged polystyrene nanoparticles became narrower as the applied potential on the substrate decreased from -4 to -0.3 kV. In the simulation results, the curvature of the convex equipotential lines near the photoresist patterns gets increased as the applied potential on the substrate decreases from -4 to -0.3kV, and, accordingly, the electric field lines become more converged.…”
Section: Process Parametersmentioning
confidence: 79%
“…Finally, control of the particle inertia is critical for highly focused and noise-free depositions of nanoparticles in IAAL, and, in this respect, it is important to avoid using highly charged nanoparticles to control the particle inertia. Lee et al 91) showed the influence of charges that nanoparticles possessed on the resolution of their deposited structures both experimentally and computationally. They electrosprayed 30-nm polystyrene nanoparticles on a silicon substrate on which 3-µm wide lines and 2-µm wide circles were prepatterned with a photoresist with thickness of 1.3-µm.…”
Section: Process Parametersmentioning
confidence: 99%
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“…Meanwhile, Ozasa et al (2008) made direct measurement using KFM to observe the negative values of surface potential patterns on tris(8-hydroxyquinolinato)aluminum(III) (Alq 3 ) thin film. The surface charges on a photoresist surface generated by corona discharge of N 2 positive ions were also measured using KFM (Lee et al, 2009). In the measurements of KFM, a conductive probe is used to detect the electrostatic force generated by the potential difference between the sample surface and the probe.…”
Section: Introductionmentioning
confidence: 99%