Nanofabrication 2020
DOI: 10.1088/978-0-7503-2608-7ch4
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Focused electron beam induced deposition

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Cited by 7 publications
(14 citation statements)
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“…Focused electron beam-induced deposition (FEBID) is an additive, direct-write technique based on the local decomposition of precursor molecules by a focused electron beam [ 324 , 325 , 326 ]. A gas injection system continuously delivers gaseous precursor molecules into the vacuum chamber, where they adsorb, diffuse and eventually desorb again from the surface.…”
Section: Development Of Ultra-sharp Mfm Tipsmentioning
confidence: 99%
“…Focused electron beam-induced deposition (FEBID) is an additive, direct-write technique based on the local decomposition of precursor molecules by a focused electron beam [ 324 , 325 , 326 ]. A gas injection system continuously delivers gaseous precursor molecules into the vacuum chamber, where they adsorb, diffuse and eventually desorb again from the surface.…”
Section: Development Of Ultra-sharp Mfm Tipsmentioning
confidence: 99%
“…Focused ion/electron beam induced deposition (FIBID/ FEBID) is a handy tool for nanofabrication, nanopatterning and engineering of the devices at the nanoscale [1][2][3][4][5]. It is successfully utilized to fabricate nanodevices and patterns with different functionalities such as SQUID devices [6,7], superconducting proximity devices [8,9], 3D structures with vertical alignment [10,11] etc.…”
Section: Introductionmentioning
confidence: 99%
“…It is successfully utilized to fabricate nanodevices and patterns with different functionalities such as SQUID devices [6,7], superconducting proximity devices [8,9], 3D structures with vertical alignment [10,11] etc. Compared to other nanofabrication techniques such as electron beam lithography (EBL) and optical lithography techniques, FIBID/FEBID offers advantages as being a single step process devoid of use of masks/resist for the growth of nanodevices [1][2][3][4][5]12]. The typical resolution offered by gallium ions (Ga + ) ions in FIB is in the range of ∼30 nm [4], while for electrons and helium ions (He + ) it is in the range of ∼10 nm and less [5].…”
Section: Introductionmentioning
confidence: 99%
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“…This results in metal-enriched permanent 2D or 3D nanostructures [8], whilst volatile fragments are pumped away. FEBIP general set up and operating principles have been comprehensively described in literature [9,10] together with the promising applications of these deposits in the fields of nanoelectronics [11], nanomagnetics [12,13], photonics [7], plasmonics [14,15], superconductors [16,17], (bio)sensors [18][19][20], etc. However, one of the main challenges associated to this methodology is that precursor materials do not fully dissociate under the electron beam.…”
Section: Introductionmentioning
confidence: 99%