Focus budget improvement using optimized wafer edge settings

Lamonds, Lucas; Orf, Bryan; Frachel, Michael; Thrun, Xaver; Erley, Georg; Groeger, Philip; Habets, Boris; Muehle, Alexander

doi:10.1117/12.2514978

Metrology, Inspection, and Process Control for Microlithography XXXIII 2019

DOI: 10.1117/12.2514978

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Focus budget improvement using optimized wafer edge settings

Lucas Lamonds

Bryan Orf

Michael Frachel

et al.

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Focus budget improvement using optimized wafer edge settings

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