Fluorine Profile Distortion upon Annealing by the Presence of a CVD Grown Boron Box

Abstract

We provide experimental evidence of the distortion of a F profile by the presence of a CVD grown B box. After annealing, a depletion in the F profile is observed fitting the position of the immobile part of B profile. To study this phenomenon further experiments were designed and atomistic simulations were done using a recently developed F model. In this model F complexes with both Si interstitials (F-I) and vacancies (F-V) are included. The formation of Boron-Interstitial Clusters is found to reduce the local Si interstitials defect concentration. This feature may be responsible for the reported F distortion by the presence of a B box.