Fluorine‐ and siloxane‐containing polymers for supercritical carbon dioxide lithography

Sha, Jing; Ober, Christopher K.

doi:10.1002/pi.2533

Cited by 11 publications

(8 citation statements)

References 14 publications

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“…Fluoropolymers exhibit remarkable properties, − such as chemical resistance (to acids, bases, organic solvents), low dielectric constants and dissipation factors, hydrophobic and oleophobic properties, excellent weathering, and interesting surface properties. Hence, these high-value-added materials can find applications in many fields of high technology such as aeronautics, microelectronics, optics, , textile finishing, in the nuclear industry, in paints and coatings, and microlithography …”

Section: Introductionmentioning

confidence: 99%

“…Hence, these high value-added-materials can find applications in many fields of high technology such as aeronautics, 8 microelectronics, 9 optics, 10,11 textile finishing, 12 in the nuclear industry, 13 in paints and coatings 14 and microlithography. 15 Chlorotrifluoroethylene (CTFE) was first polymerized in 1934 (its polymerization was patented in 1937). 16 It yields hydrophobic polymers with chemical and thermal resistance along with good mechanical properties.…”

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confidence: 99%

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Synthesis and Modification of Alternating Copolymers Based on Vinyl Ethers, Chlorotrifluoroethylene, and Hexafluoropropylene

2009

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Fluorinated copolymers bearing ammonium groups were prepared by radical copolymerization of fluorinated olefins (chlorotrifluoroethylene, hexafluoropropylene) with different vinyl ethers (2-chloroethyl, cyclohexyl, n-butyl, and ethyl vinyl ethers) followed by the cationization of these copolymers with trimethylamine. Copolymers were obtained in high yield (generally >85%), with molecular weights ranging from 8000 to 25 000 g mol−1. From elemental analysis as well as 1H and 19F NMR spectroscopy, the alternating structure of these polymers was confirmed. The chemical modification of these copolymers consisted of a two-step reaction: (i) the replacement of the chlorine atom by an iodine atom followed by (ii) the substitution of the halogen atom by the trimethylamine into a quaternary ammonium. The resulting copolymers were characterized with the usual techniques to assess their compositions and structures. Their thermal analyses, in dynamic mode, under air, showed decomposition temperatures (T d,10%) higher than 200 °C. Electrochemical properties of some of these polymers were also studied, showing ionic exchange capacities (IEC) ranging from 0.50 to 0.75 mequiv g−1 (theoretical IEC up to 3.63 mequiv g−1) and water uptake of 13−25%.

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Section: Introductionmentioning

confidence: 99%

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confidence: 99%

Synthesis and Modification of Alternating Copolymers Based on Vinyl Ethers, Chlorotrifluoroethylene, and Hexafluoropropylene

2009

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“…Fluoropolymers exhibit remarkable properties such as chemical resistance (to acids, bases, organic solvents), low dielectric constants and dissipation factors, hydrophobic and oleophobic properties, excellent weathering, and interesting surface properties 1. Hence, these high added‐value materials can find applications in many fields of high technology such as aeronautics,2 microelectronics,3 optics,4 textile finishing,5 nuclear industry,6 paints and coatings,7 and microlithography 8. When fluorinated olefins are copolymerized with hydrophilic monomers, amphiphilic fluoropolymers can be obtained and be used as surfactants,9 magnetic resonance imaging contrast agents,10 surface modifiers,11 or membranes 12.…”

Section: Introductionmentioning

confidence: 99%

Random and block styrenic copolymers bearing both ammonium and fluorinated side‐groups

Valade

Boschet

Améduri

2011

J. Polym. Sci. A Polym. Chem.

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1H,1H,2H,2H‐Perfluorooctyloxymethylstyrene (FS) was prepared and copolymerized with chloromethylstyrene (CMS). Conventional radical copolymerization of both these aromatic monomers led to poly(CMS‐co‐FS) random copolymers for which CMS was shown to be more reactive than the fluorinated comonomer. Their controlled radical copolymerization based on degenerative transfer, namely iodine transfer polymerization (ITP), led to various poly(CMS)‐b‐poly(FS) block copolymers. Molecular weights of poly(CMS‐co‐FS) copolymers reached 33,000 g mol−1 while those of poly(CMS)‐b‐ poly(FS) block copolymers were 22,000 g mol−1. Their composition ranged from 18 to 61 mol.% in FS. These copolymers were modified via a cationization step, aiming at replacing the chlorine atom in CMS unit by a trimethylammonium group, leading to the formation of cationic sites. The resulting functionalized copolymers exhibited different solubilities. If both copolymerization techniques led to water‐insoluble copolymers, the block architecture enabled incorporating lower FS proportion, resulting in more cationic sites. © 2011 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2011

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“…Fortunately, organofluorine and organosilicon materials possess many unique characteristics, e.g. hydrophobicity, weathering resistance, low coefficients of friction, water impermeability and low refractive indices, and they have been used in the modification of thermal-curing epoxy systems [8][9][10][11][12] . To incorporate fluorine and silicon into UV-curable epoxy resins may simultaneously modify the abovementioned resins' properties 13 .…”

Section: Introductionmentioning

confidence: 99%

UV-cured Epoxy Methacrylate Composite Containing Fluorine and Siloxane

Tang

Liu

2010

Polymers and Polymer Composites

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The synthesis and characterization of methacryloxysiloxane (MAS) were described. UV-curable composites, bisphenol-Aepoxymethacrylate/2,2,3,4,4,4-hexafluorobutyl methacrylate (BEMA/HFMA) and BEMA/HFMA/MAS composite systems were built, and the preparation method is described. The effects of HFMA and MAS content on the surface properties, thermal behaviour and water resistance of the cured composite films were investigated by contact angle, TGA and DSC, water resistance ratio; the dispersion of the three components was observed by micromorphological examination, and the results are discussed.

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Fluorine‐ and siloxane‐containing polymers for supercritical carbon dioxide lithography

Cited by 11 publications

References 14 publications

Synthesis and Modification of Alternating Copolymers Based on Vinyl Ethers, Chlorotrifluoroethylene, and Hexafluoropropylene

Synthesis and Modification of Alternating Copolymers Based on Vinyl Ethers, Chlorotrifluoroethylene, and Hexafluoropropylene

Random and block styrenic copolymers bearing both ammonium and fluorinated side‐groups

UV-cured Epoxy Methacrylate Composite Containing Fluorine and Siloxane

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