Fluid simulation of the pulsed bias effect on inductively coupled nitrogen discharges for low-voltage plasma immersion ion implantation

Sun, Xiao-Yan; Zhang, Yuru; Li, Xuechun; Wang, You‐Nian

doi:10.1088/1674-1056/26/1/015201

Cited by 4 publications

(3 citation statements)

References 43 publications

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“…The 2D fluid module, which has been described in earlier studies, [17][18][19][20] is mainly composed of a plasma module and an electromagnetic module.…”

Section: Fluid Modulementioning

confidence: 99%

“…Because the distribution of plasma characteristics is vital for controlling the process of semiconductor etching, it is of great interest to elucidate the effect of bias on the plasma distributions. Therefore, in this study, the multi-physics analysis for plasma sources-ICP (MAPS-ICP) solver [17][18][19][20][21] composed of a fluid module and a sheath module [22,23] is employed to investigate the effects of single-frequency and dual-frequency bias on the plasma characteristics at different values of ICP source power. Our results provide a useful insight into the effect of source power, which can be used for optimizing the plasma processing techniques.…”

Section: Introductionmentioning

confidence: 99%

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Effect of radio frequency bias on plasma characteristics of inductively coupled argon discharge based on fluid simulations*

et al. 2020

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A fluid model is employed to investigate the effect of radio frequency bias on the behavior of an argon inductively coupled plasma (ICP). In particular, the effects of ICP source power, single-frequency bias power, and dual-frequency bias power on the characteristics of ICP are simulated at a fixed pressure of 30 mTorr (1 Torr = 1.33322 × 102 Pa). When the bias frequency is fixed at 27.12 MHz, the two-dimensional (2D) plasma density profile is significantly affected by the bias power at low ICP source power (e.g., 50 W), whereas it is weakly affected by the bias power at higher ICP source power (e.g., 100 W). When dual-frequency (27.12 MHz/2.26 MHz) bias is applied and the sum of bias powers is fixed at 500 W, a pronounced increase in the maximum argon ion density is observed with the increase of the bias power ratio in the absence of ICP source power. As the ratio of 27.12-MHz/2.26-MHz bias power decreases from 500 W/0 W to 0 W/500 W with the ICP source power fixed at 50 W, the plasma density profiles smoothly shifts from edge-high to center-high, and the effect of bias power on the plasma distribution becomes weaker with the bias power ratio decreasing. Besides, the axial ion flux at the substrate surface is characterized by a maximum at the edge of the substrate. When the ICP source power is higher, the 2D plasma density profiles, as well as the spatiotemporal and radial distributions of ion flux at the substrate surface are characterized by a peak in the reactor center, and the distributions of plasma parameters are negligibly affected by the dual-frequency bias power ratio.

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“…The 2D fluid module, which has been described in earlier studies, [17][18][19][20] is mainly composed of a plasma module and an electromagnetic module.…”

Section: Fluid Modulementioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Effect of radio frequency bias on plasma characteristics of inductively coupled argon discharge based on fluid simulations*

et al. 2020

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“…Their numerical model can aid in determining the optimal conditions for producing the ideal plasma. Sun et al [13,14] studied ICP plasma characteristics by using two-dimensional self-consistent fluid model. It was found that the spatial distribution of plasma characteristics was controlled by changing the bias power of single frequency bias or high frequency bias power ratio of double frequency offset.…”

Section: Introductionmentioning

confidence: 99%

Numerical simulation and experimental validation of multiphysics field coupling mechanisms for a high power ICP wind tunnel*

Yu¹,

Wang²,

Qiu³

et al. 2021

Chinese Phys. B

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We take the established inductively coupled plasma (ICP) wind tunnel as a research object to investigate the thermal protection system of re-entry vehicles. A 1.2-MW high power ICP wind tunnel is studied through numerical simulation and experimental validation. The distribution characteristics and interaction mechanism of the flow field and electromagnetic field of the ICP wind tunnel are investigated using the multi-field coupling method of flow, electromagnetic, chemical, and thermodynamic field. The accuracy of the numerical simulation is validated by comparing the experimental results with the simulation results. Thereafter, the wind tunnel pressure, air velocity, electron density, Joule heating rate, Lorentz force, and electric field intensity obtained using the simulation are analyzed and discussed. The results indicate that for the 1.2-MW ICP wind tunnel, the maximum values of temperature, pressure, electron number density, and other parameters are observed during coil heating. The influence of the radial Lorentz force on the momentum transfer is stronger than that of the axial Lorentz force. The electron number density at the central axis and the amplitude and position of the Joule heating rate are affected by the radial Lorentz force. Moreover, the plasma in the wind tunnel is constantly in the subsonic flow state, and a strong eddy flow is easily generated at the inlet of the wind tunnel.

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Fluid simulation of the plasma uniformity in pulsed dual frequency inductively coupled plasma

et al. 2019

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As the wafer size increases, pulsed dual frequency inductively coupled plasma sources have been proposed as an effective method to achieve large-area uniform plasmas. A two-dimensional (2D) self-consistent fluid model, combined with an electromagnetic module, has been employed to investigate the influence of the pulse duty cycle and the pulse phase shift on the plasma radial uniformity in an argon discharge. When both antennas are pulsed, the best radial uniformity is obtained at 30%, due to the balance between the positive feedback and diffusion loss. When the duty cycle decreases, the bulk plasma density becomes lower since the power absorption is limited during the shorter active-glow period. As the duty cycle decreases to 10%, the plasma density is characterized by an edge-high profile because of the strong diffusion. When the pulse duty cycle of the outer two-turn coil is fixed at 70%, the plasma density profiles shift from center-high over uniform to edge-high as the pulse duty cycle of the inner coil decreases from 50% to 10%, and the best plasma uniformity appears at 30%. In addition, by adjusting pulse phase shifting of two antennas, the plasma uniformity could also be improved, and the nonuniformity degree decreases from 0.138 for the synchronous pulse to about 0.101 for the asynchronous pulse.

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Fluid simulation of the pulsed bias effect on inductively coupled nitrogen discharges for low-voltage plasma immersion ion implantation

Cited by 4 publications

References 43 publications

Effect of radio frequency bias on plasma characteristics of inductively coupled argon discharge based on fluid simulations*

Effect of radio frequency bias on plasma characteristics of inductively coupled argon discharge based on fluid simulations*

Numerical simulation and experimental validation of multiphysics field coupling mechanisms for a high power ICP wind tunnel*

Fluid simulation of the plasma uniformity in pulsed dual frequency inductively coupled plasma

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