2005
DOI: 10.1016/j.jcrysgro.2004.11.052
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Fluid flow and solute segregation in EFG crystal growth process

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Cited by 22 publications
(18 citation statements)
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(11 reference statements)
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“…The influence of the ambient temperature distribution [10,12] and of the pulling rate [12,13,[15][16][17][18] on the void distribution in the rod-shaped sapphire crystals have been studied by numerical simulation of the heat, momentum and mass transfer, using the STHAMAS 3D software [10,12] and the FIDAP software [13,[15][16][17][18]. The influence of the melt flow on the impurity distribution in various growth methods has been studied by many investigators, both experimentally and theoretically.…”
Section: Numerical Simulationmentioning
confidence: 99%
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“…The influence of the ambient temperature distribution [10,12] and of the pulling rate [12,13,[15][16][17][18] on the void distribution in the rod-shaped sapphire crystals have been studied by numerical simulation of the heat, momentum and mass transfer, using the STHAMAS 3D software [10,12] and the FIDAP software [13,[15][16][17][18]. The influence of the melt flow on the impurity distribution in various growth methods has been studied by many investigators, both experimentally and theoretically.…”
Section: Numerical Simulationmentioning
confidence: 99%
“…The model for fluid flow and mass transfer, the boundary conditions used for the two shaper geometries (a central capillary channel shaper-CCC and an annular capillary channel shaper-ACC) are described in Refs. [13,[15][16][17][18]. The influence of the die design on the fluid flow and on the impurity distribution is studied for various meniscus heights, Marangoni numbers and segregation coefficients.…”
Section: Article In Pressmentioning
confidence: 99%
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“…Influence of the shaper geometry and various growth conditions on the fluid flow and on the impurities distribution in rod growth by EFG method was reported in [13]. In [14] a numerical analysis concerning the dependence of the Al distribution on the pulling rate and on the radius of the capillary channel for thin Si rod growth was undertaken.…”
Section: Introductionmentioning
confidence: 99%