2002
DOI: 10.1007/bf02892627
|View full text |Cite
|
Sign up to set email alerts
|

Flow behavior at the embossing stage of nanoimprint lithography

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

7
46
0

Year Published

2005
2005
2013
2013

Publication Types

Select...
5
2

Relationship

0
7

Authors

Journals

citations
Cited by 62 publications
(53 citation statements)
references
References 9 publications
7
46
0
Order By: Relevance
“…Moreover, the purpose of the present study is to explore the applicability of simple models, and this can be limited to simple behaviors in a first stage. For the same reason, and like in many other studies, surface tension is neglected here, although it may play an important role at the nano scale and has been taken into account by Jeong et al (2002) and Rowland et al (2005), among others. A consequence of these assumptions is that the process parameter can be indifferently either the downward velocity V of the mold or the force F applied per unit pattern length, since these two quantities are proportional when the fluid is Newtonian.…”
Section: Problem Statementmentioning
confidence: 99%
See 3 more Smart Citations
“…Moreover, the purpose of the present study is to explore the applicability of simple models, and this can be limited to simple behaviors in a first stage. For the same reason, and like in many other studies, surface tension is neglected here, although it may play an important role at the nano scale and has been taken into account by Jeong et al (2002) and Rowland et al (2005), among others. A consequence of these assumptions is that the process parameter can be indifferently either the downward velocity V of the mold or the force F applied per unit pattern length, since these two quantities are proportional when the fluid is Newtonian.…”
Section: Problem Statementmentioning
confidence: 99%
“…Nanoimprint lithography can be used to reproduce a variety of patterns, like periodic arrays of pillars or holes with circular or square cross-sections, among others (see Guo, 2004, for examples), but simple lines are very frequently used to demonstrate the technique, as in the pioneering papers by Chou et al (1995Chou et al ( , 1996, and to test models (Jeong et al, 2002;Rowland et al, 2005;Young, 2005, for instance). One advantage of line patterns is the two-dimensional flow involved, which allows the study of a mere cross section.…”
Section: Problem Statementmentioning
confidence: 99%
See 2 more Smart Citations
“…Jeong et al, study simulated hot embossing micro/nano-manufacturing with thin films, including the effects of capillary force and width of stamp groove on the flow behavior during embossing. Simulations showed double peak flow for regions of large width, slow printing speeds and with surface tension as a significant factor (Jeong et al, 2002). Macintyre and Thoms developed a method to directly observe the flow of resist arising from NIL.…”
Section: Filling Processmentioning
confidence: 99%