Flexible two-dimensional indium tin oxide fabricated using a liquid metal printing technique

Datta, Robi S.; Syed, Nitu; Zavabeti, Ali; Jannat, Azmira; Mohiuddin, M.; Rokunuzzaman,; Zhang, Baoyue; Rahman, Ataur; Atkin, Paul; Messalea, Kibret A; Ghasemian, Mohammad B.; Gaspera, Enrico Della; Bhattacharyya, Semonti; Fuhrer, Michael S.; Russo, Salvy P.; McConville, Christopher F; Esrafilzadeh, Dorna; Kalantar‐zadeh, Kourosh; Daeneke, Torben

doi:10.1038/s41928-019-0353-8

Cited by 194 publications

(218 citation statements)

References 43 publications

Supporting

Mentioning

184

Contrasting

Order By: Relevance

“…[ 70 ] Any residual liquid metal inclusions are capable of being further removed by virtue of a developed cleaning process, obtaining highly ultrathin oxide sheets on desired substrates. [ 71 ] These extraordinary characteristics allow clean delamination of the skin from the parent liquid metal and successful transfer to the target substrate, providing a possibility of fabricating various naturally formed pure and mixed 2DMOs.…”

Section: Features Of Liquid Metalsmentioning

confidence: 99%

“…[ 61 ] Recently, wafer‐scale ITO sheets with thicknesses of only a few atoms were fabricated by isolating the skin of In–Sn alloys through the vdW exfoliation. [ 71 ] The 2D sheets are found to be laterally large and continuous from the TEM images. The deposited 2D ITO is ultratransparent, electrically conductive, and suitable for the fabrication of fully functional capacitive touch screens.…”

Section: Fabrication Strategies Of 2d Metal Oxides Via Liquid Metalsmentioning

confidence: 99%

See 1 more Smart Citation

Liquid Metals: A Novel Possibility of Fabricating 2D Metal Oxides

Zhao

Zhang

2021

Advanced Materials

View full text Add to dashboard Cite

2D metal oxides (2DMOs) have been widely applied in the fields of electronic, magnetic, optical, and catalytic materials, owing to their rich surface chemistry and unique electronic structures. However, their further development faces challenges such as the difficulty in fabricating 2DMOs with unstable surface induced by strong surface polarizability, or the high cost and limited yield of the fabrication process. Recently, liquid metals have shown great potential in the fabrication of 2DMOs. The native oxide skin formed on the surface of liquid metals can be considered as a perfect 2D planar material. Due to the solubility, fluidity, and reactivity of liquid metals, they can act as the solvent, reactant, and interface in the fabrication of 2DMOs. Moreover, liquid metals undergo a liquid–solid phase transition, enabling them to be a symmetric matched substrate for growing high‐quality 2DMOs. An insightful survey of the recent progress in this research direction is presented. The features of liquid metals including good solubility, chemical reactivity, weak interface force, and liquid–solid phase transitions are introduced in detail. Furthermore, strategies for the fabrication of 2DMOs by virtue of these features are summarized comprehensively. Finally, current challenges and prospects regarding the future development in the fabrication of 2DMOs via liquid metals are highlighted.

show abstract

Section: Features Of Liquid Metalsmentioning

confidence: 99%

Section: Fabrication Strategies Of 2d Metal Oxides Via Liquid Metalsmentioning

confidence: 99%

Liquid Metals: A Novel Possibility of Fabricating 2D Metal Oxides

Zhao

Zhang

2021

Advanced Materials

View full text Add to dashboard Cite

show abstract

“…The MoS 2 film could be transferred even on flexible polyethylene terephthalate (PET, Figure 4b). Combining with the currently developed liquidmetal-deposition techniques, [29,30] it allows the application in flexible electronics.…”

Section: Doi: 101002/adma202003542mentioning

confidence: 99%

High‐Throughput Growth of Wafer‐Scale Monolayer Transition Metal Dichalcogenide via Vertical Ostwald Ripening

et al. 2020

View full text Add to dashboard Cite

For practical device applications, monolayer transition metal dichalcogenide (TMD) films must meet key industry needs for batch processing, including the high‐throughput, large‐scale production of high‐quality, spatially uniform materials, and reliable integration into devices. Here, high‐throughput growth, completed in 12 min, of 6‐inch wafer‐scale monolayer MoS2 and WS2 is reported, which is directly compatible with scalable batch processing and device integration. Specifically, a pulsed metal–organic chemical vapor deposition process is developed, where periodic interruption of the precursor supply drives vertical Ostwald ripening, which prevents secondary nucleation despite high precursor concentrations. The as‐grown TMD films show excellent spatial homogeneity and well‐stitched grain boundaries, enabling facile transfer to various target substrates without degradation. Using these films, batch fabrication of high‐performance field‐effect transistor (FET) arrays in wafer‐scale is demonstrated, and the FETs show remarkable uniformity. The high‐throughput production and wafer‐scale automatable transfer will facilitate the integration of TMDs into Si‐complementary metal‐oxide‐semiconductor platforms.

show abstract

“…Another report has shown that indium tin oxide nanosheets can be printed from a liquid InSn alloy held at 200 C via sandwiching the alloy between two substrates which when removed results in ITO nanosheets deposited on the top substrate. 45 The method presented here produces a high proportion of very thin nanosheets in a relatively straightforward process at room temperature. Electrochemical water splitting in alkaline conditions using various types of cobalt oxides/hydroxides, have been studied previously at a variety of morphologies, including nanosheets, however they have been signicantly thicker than reported here at around 6 monolayers per sheet for Co(OH) 2 .…”

Section: Resultsmentioning

confidence: 99%