-In this letter, solution-processed flexible zinc-tin oxide (Z 0.35 T 0.65 O 1.7 ) thin-film transistors with electrochemically oxidized gate insulators (AlOx:Nd) fabricated on ultra-thin (30 μm) polyimide substrates are presented. The AlOx:Nd insulators exhibited wonderful stability under bending and excellent insulating properties with low leakage current, high dielectric constant, and high breakdown field. The device exhibited a mobility of 3.9 cm 2 /V · s after annealing at 300°C. In addition, the flexible device was able to maintain the electricity performance under various degrees of bending, which was attributed to the ultra-thin polyimide substrate.