2014
DOI: 10.1016/j.commatsci.2013.07.048
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First-principles study of oxygen and aluminum defects in β-Si3N4: Compensation and charge trapping

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Cited by 14 publications
(8 citation statements)
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“…Various candidates for defect energy levels in β-Si 3 N 4 and β-SiAlON have been reported [15,16,20,[23][24][25][26][27]. The band gap energies between the valence band (VB) and conduction band (CB) have been reported to be 5.0-5.3 eV.…”
Section: Blue Emission and Nitrogen Vacancymentioning
confidence: 99%
“…Various candidates for defect energy levels in β-Si 3 N 4 and β-SiAlON have been reported [15,16,20,[23][24][25][26][27]. The band gap energies between the valence band (VB) and conduction band (CB) have been reported to be 5.0-5.3 eV.…”
Section: Blue Emission and Nitrogen Vacancymentioning
confidence: 99%
“…(i) Eu = 0, defect and afterglow: nitrogen vacancy (V N ) defects models, as for β-SiAlON or β-Si 3 N 4 , have been proposed [19,20,26,[31][32][33], as shown in figure 13(b). This V N is composed of three Si-DBs, and it behaves as a trap center for electrons or holes.…”
Section: Tl and Energy Levels Of Defectsmentioning
confidence: 99%
“…While, the N‐rich condition means that μN is taken as the energy per atom of the N 2 molecule, and μSi=13μnormalSi3normalN44μnormalN. In addition, for the chemical potentials of impurities, μO are given by the stability limit of α‐quartz phase of silica (α‐SiO 2 ) () and μAl is taken as the energy per atom of crystalline fcc Al.…”
Section: Calculation Proceduresmentioning
confidence: 99%
“…studies the impact of hydrogen in Si 3 N 4 layer on the MONOS‐type memory during P/E cycles . Post deposition annealing causes aluminum (Al) and oxygen (O) impurities diffusion into SiN trap layer in typical TANOS memory (). And Ref.…”
Section: Introductionmentioning
confidence: 99%