2010
DOI: 10.1109/ted.2009.2038646
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First Principle Calculation of the Leakage Current Through $\hbox{SiO}_{2}$ and $\hbox{SiO}_{x}\hbox{N}_{y}$ Gate Dielectrics in MOSFETs

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Cited by 21 publications
(11 citation statements)
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“…The sequential switching property is also enhanced visibly when compared with the doped device. I-V response for such an ultra-small channel device is described by Landauer-Büttiker formula which is shown below [43]:…”
Section: Current-voltage Characteristicsmentioning
confidence: 99%
“…The sequential switching property is also enhanced visibly when compared with the doped device. I-V response for such an ultra-small channel device is described by Landauer-Büttiker formula which is shown below [43]:…”
Section: Current-voltage Characteristicsmentioning
confidence: 99%
“…This gap indicates the thermo-dynamic stability for any molecular system. [47,48]. In brief, when a voltmeter is connected between two electrodes of a two-probe system, then the difference in their Fermi energy levels can be represented by their electro-chemical potential.…”
Section: Atomistic Modelling Of Nano Bio-molecular Devicementioning
confidence: 99%
“…Researchers are The associate editor coordinating the review of this manuscript and approving it for publication was Atif Iqbal . also trying to find an alternative TFET due to the presence of leakage current in the MOSFET which uses SiO 2 as gate dielectric [7], [8].…”
Section: Introductionmentioning
confidence: 99%