Quantum dot (QD) growth on high (c3v) symmetry GaAs{111}
surfaces holds promise for efficient entangled photon sources. Unfortunately,
homoepitaxy on GaAs{111} surfaces suffers from surface roughness/defects
and InAs deposition does not natively support Stranski–Krastanov (SK) QD
growth. Surfactants have been identified as effective tools to alter the epitaxial
growth process of III-V materials, however, their use remains unexplored on
GaAs{111}. Here, we investigate Bi as a surfactant in III-As molecular beam
epitaxy (MBE) on GaAs(111)A substrates, demonstrating that Bi can eliminate
surface defects/hillocks in GaAs and (Al,Ga)As layers, yielding atomically-smooth
hillock-free surfaces with RMS roughness values as low as 0.13 nm. Increasing Bi
fluxes are found to result in smoother surfaces and Bi is observed to increase
adatom diffusion. The Bi surfactant is also shown to trigger a morphological
transition in InAs/GaAs(111)A films, directing the 2D InAs layer to rearrange into
3D nanostructures, which are promising candidates for high-symmetry quantum
dots. The desorption activation energy (UDes) of Bi on GaAs(111)A was measured
by reflection high energy electron diffraction (RHEED), yielding UDes = 1.7 ±
0.4 eV. These results illustrate the potential of Bi surfactants on GaAs(111)A and
will help pave the way for GaAs(111)A as a platform for technological applications
including quantum photonics.