Film thickness effect and substrate dependent tribo-mechanical characteristics of titanium nitride films

Kumar, D. Dinesh; Kumar, N.; Kalaiselvam, S.; Thangappan, R.; Jayavel, R.

doi:10.1016/j.surfin.2018.05.002

Cited by 17 publications

(23 citation statements)

References 46 publications

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“…The VeN thick films are textured along (111) planes presenting higher potential energy. The changes in preferred orientations and packing density with increasing the film thickness were observed in sputtered TieN films [3]. The dual phase of the VeN films deposited under 10% N 2 having a major (200) VN peak in parallel with the (111) V 2 N peak can be explained by the higher ion bombardment which leads to the higher mobility of adatoms on the VeN film surface.…”

Section: Ven Films Morphologymentioning

confidence: 90%

“…The residual stresses of the VeN films deposited on the Si (100) wafers were determined by an interferometer (Newton's rings method [3,22]) and calculated with the following Stoney's formula [24]:…”

Section: Methodsmentioning

confidence: 99%

“…Among the sputtered nitride films, vanadium nitrides offer excellent properties and present high corrosive resistance against aggressive media, and good oxidation resistance in ambient air at high temperature [3][4][5][6]. In addition, the VeN films were known to show a decrease in the friction coefficient with an increase in temperature due to the formation and melting of V 2 O 5 on the wear track during friction process [6,7].…”

Section: Introductionmentioning

confidence: 99%

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Influence of film thickness and Ar N2 plasma gas on the structure and performance of sputtered vanadium nitride coatings

Aissani

Alhussein

Nouveau

et al. 2019

Surface and Coatings Technology

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We investigated the effect of film thickness on the structure and properties of VeN coatings deposited by magnetron sputtering in an argon and nitrogen atmosphere. The nitrogen percentage was changed between 10 and 20%. Firstly, structural and morphological properties of VeN films were observed, analyzed and subsequently followed by a detailed investigation on the mechanical and tribological properties of these coatings. It has been shown that film structure, hardness and wear resistance significantly changed with varying the film thickness and the nitrogen percentage. In the case of films deposited under 10%N 2 , the presence of V 2 N phase was evident. With increasing nitrogen ratio in the deposition chamber from 10 to 20%, the structure was changed from (hc)V 2 N to multi phases of V 2 N and (fcc) VN (formation of different vanadium nitrides). The thick films containing more nitrogen were slightly dense compared to the thinner ones presenting rough surface and columnar morphology. Nanoindentation measurements showed that film mechanical behavior depends on its thickness, nitrogen percentage and microstructural features. The film hardness first increased with its thickness and then decreased. The highest hardness of 26.2 GPa was obtained for the film deposited under 20%N 2 , which is correlated with its dense structure and film stoichiometry. The film thickness has a significant effect on the tribological properties of VeN films. The minimum friction coefficient of 0.4 was found for the thickest film of 2500 nm. The wear rate gradually decreased with increasing the film thickness, due to the high hardness, presence of VN phase and the strong adhesion between film and substrate.

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Section: Ven Films Morphologymentioning

confidence: 90%

Section: Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Influence of film thickness and Ar N2 plasma gas on the structure and performance of sputtered vanadium nitride coatings

Aissani

Alhussein

Nouveau

et al. 2019

Surface and Coatings Technology

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“…Pshyk et al [24] synthesized multilayer TiAlSiYN/MoN coatings that had improved mechanical properties in comparison to a single-layer TiAlSiYN nanocomposite film. The cohesive strength between multilayer and substrate is another crucial problem in multilayer film design and is affected by substrate roughness [25], substrate temperature [25,26], different thermal expansion coefficient in the film-substrate couple [27,28], and film thickness [29,30,31], etc. A novel nanoindentation technique has been proposed and was employed to test the nanomechanical properties of multilayered Al 2 O 3 /TiO 2 nanolaminates [32].…”

Section: Introductionmentioning

confidence: 99%

“…Screening and designing membrane material systems and film thicknesses are of great importance for the fabrication of high quality multilayer materials [18,23]. However, extensive study on the relationship between the cohesion of the film-substrate couple and film thickness has rarely been reported to date [29,30,31]. Based on the important application prospects of multilayer films in many fields [16,18,22,23], this work focuses on the influence of a Mo interlayer on the cohesion of an Si-based Ti film.…”

Section: Introductionmentioning

confidence: 99%

Effect of Thickness of Molybdenum Nano-Interlayer on Cohesion between Molybdenum/Titanium Multilayer Film and Silicon Substrate

et al. 2019

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Titanium (Ti) film has been used as a hydrogen storage material. The effect of the thickness of a molybdenum (Mo) nano-interlayer on the cohesive strength between a Mo/Ti multilayer film and a single crystal silicon (Si) substrate was investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), and nano-indenter. Four groups of Si/Mo/Ti multilayer films with different thicknesses of Mo and Ti films were fabricated. The XRD results showed that the introduction of the Mo layer suppressed the chemical reaction between the Ti film and Si substrate. The nano-indenter scratch results demonstrated that the cohesion between the Mo/Ti film and Si substrate decreased significantly with increasing Mo interlayer thickness. The XRD stress analysis indicated that the residual stress in the Si/Mo/Ti film was in-plane tensile stress which might be due to the lattice expansion at a high film growth temperature of 700 °C and the discrepancy of the thermal expansion coefficient between the Ti film and Si substrate. The tensile stress in the Si/Mo/Ti film decreased with increasing Mo interlayer thickness. During the cooling of the Si substrate, a greater decrease in tensile stress occurred for the thicker Mo interlayer sample, which became the driving force for reducing the cohesion between the Mo/Ti film and Si substrate. The results confirmed that the design of the Mo interlayer played an important role in the quality of the Ti film grown on Si substrate.

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Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

Bharani

Sharma

2022

Physica Status Solidi (a)

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Transition metal nitride (TMN) thin films exhibit outstanding physical, chemical, and mechanical properties, making them best suitable for a wide variety of applications. The most commonly used technique to produce metal nitride thin films with specific properties at optimum conditions is magnetron sputtering. Considering this, this review begins with advancements in the sputtering process from basic diode sputtering to the most commonly used pulsed magnetron sputtering. Further, the literature on several TMNs deposited via magnetron sputtering is summarized, referring to several articles that have been published during the last decades. The main emphasis lies on nitride-based thin films' structural, morphological, and mechanical aspects for various applications. In addition, the influence of reactive gas flow rate, substrate temperature, layer thickness, postannealing temperature, substrate bias voltage, protective layers, the sputtering technique adopted, etc. on the quality and performance of the thin films is also focused. The overall review work can be beneficial for the students and researchers in understanding the basic sputtering phenomenon with its advancements, the relationship between deposition parameters and surface properties, and to know the current research trend for exploring several research gaps in the literature.

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Film thickness effect and substrate dependent tribo-mechanical characteristics of titanium nitride films

Cited by 17 publications

References 46 publications

Influence of film thickness and Ar N2 plasma gas on the structure and performance of sputtered vanadium nitride coatings

Influence of film thickness and Ar N2 plasma gas on the structure and performance of sputtered vanadium nitride coatings

Effect of Thickness of Molybdenum Nano-Interlayer on Cohesion between Molybdenum/Titanium Multilayer Film and Silicon Substrate

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

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