Film Synthesis on Powders by Cathodic ARC Plasma Deposition

Abstract

Cathodic arc plasma deposition was used to coat Al2O3 powder (mesh size 60) with platinum. the power particles were moved during deposition using a mechanical system operating at a resonance frequency of 20 Hz. Scanning electron microscopy and auger electron microscopy show that all particles are completely coated with a platinum film having a thickness of about 100 nm. the actual deposition time was only 20 s, thus the deposition rate was very high (5 nm/s).

Transmissible Plasma-Evolved Suspended Graphene for TEM Observation Window

“…These results along with Raman, TEM, and XPS data of protocol P2′_Co produced TPEG indicate that the a-C membrane in the mesh part of the grid was efficiently transformed into graphene by catalytically active Co plasma. Metal plasma emitted by pulsed APD mainly contained excited metal ions, whose energy is about several hundred electronvolts. , Therefore, we consider that during the transmission, the energy transfer from metal plasma to a-C occurred, leading to the formation of graphene.…”

“…Metal plasma emitted by pulsed APD mainly contained excited metal ions, whose energy is about several hundred electronvolts. 31,32 Therefore, we consider that during the transmission, the energy transfer from metal plasma to a-C occurred, leading to the formation of graphene.…”

“…Pulsed APD is a kind of physical vapor deposition in which a target element gets ionized with an applied pulsed bias voltage (Figure S1) and is then sputtered onto the substrate. , The metal plasma (>80% metal ions) was produced using a small cathodic arc plasma gun. The details are shown in previous reports. , Briefly, high-purity metals (≥99.5%) were used as the target materials. The cathode is a rod made of the target material to be transformed into a plasma.…”

“…The details are shown in previous reports. 31,32 Briefly, high-purity metals (≥99.5%) were used as the target materials. The cathode is a rod made of the target material to be transformed into a plasma.…”

Temperature-independent formation of Au nanoparticles in ionic liquids by arc plasma deposition

“…Regarding the sputtering deposition technique, it has recently been determined that both the temperature and the stabilizing ability of ILs, especially the type of anion, play key roles as factors that control the size of NPs. [23,24] In the present study, we report an effective preparation method of metal NPs using an arc plasma deposition (APD) technique [25,26], combined with the use of ILs as capture media. By this method, it is possible to achieve easy control of the size of the NPs by the selection of some experimental conditions.…”