1997
DOI: 10.1016/s0921-5107(96)01957-5
|View full text |Cite
|
Sign up to set email alerts
|

Film stress measurements for high temperature micromechanical and microelectronical applications based on SiC

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4

Citation Types

1
4
0

Year Published

2006
2006
2018
2018

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 6 publications
(5 citation statements)
references
References 5 publications
1
4
0
Order By: Relevance
“…Therefore, the Raman measurements correlates well with the FTIR investigations. A similar nonlinear behaviour of the TO phonon vibration frequencies was found in the case of 3C-SiC layers deposited on silicon substrate grown by chemical vapour deposition[20][21].SummaryThe overall stress in 2H-AlN/3C-SiC(111)/Si (111) heteroepitaxial layer is caused by the mismatch stress and thermo-elastic stress. The increasing Ge concentration at the interface confines the stress in the near interface region and reduces the tensile stress in the upper part of the layer.…”
supporting
confidence: 57%
“…Therefore, the Raman measurements correlates well with the FTIR investigations. A similar nonlinear behaviour of the TO phonon vibration frequencies was found in the case of 3C-SiC layers deposited on silicon substrate grown by chemical vapour deposition[20][21].SummaryThe overall stress in 2H-AlN/3C-SiC(111)/Si (111) heteroepitaxial layer is caused by the mismatch stress and thermo-elastic stress. The increasing Ge concentration at the interface confines the stress in the near interface region and reduces the tensile stress in the upper part of the layer.…”
supporting
confidence: 57%
“…The leading techniques to measure internal stresses probably are the curvature method [4][5][6][7][8][9][10][11][12][13][14], Raman spectroscopy [4,5,8,15] and, in various forms, X-ray diffraction [3,[7][8][9]15,16]. These methods make possible in situ measurements, which allow in particular the evolution of the coating stress to be controlled through the deposition process [5,6].…”
Section: Introductionmentioning
confidence: 99%
“…These methods make possible in situ measurements, which allow in particular the evolution of the coating stress to be controlled through the deposition process [5,6]. Other techniques however are suitable, such as mechanical spectroscopy (vibrating-reed technique) [15] or neutron diffraction (fairly similar to X-rays from the point of view of the principle) [7,16], even though these latter techniques are not commonly used in the case of films.…”
Section: Introductionmentioning
confidence: 99%
See 2 more Smart Citations