2008
DOI: 10.1007/s00339-008-4696-7
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Film growth mechanisms in pulsed laser deposition

Abstract: This paper reviews our recent studies of the fundamentals of growth morphology evolution in Pulsed Laser Deposition in two prototypical growth modes: metal-on-insulator island growth and semiconductor homoepitaxy. By comparing morphology evolution for pulsed laser deposition and thermal deposition in the same dual-use chamber under identical thermal, background, and surface preparation conditions, and varying the kinetic energy by varying the laser fluence or using an inert background gas, we have isolated the… Show more

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Cited by 88 publications
(57 citation statements)
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References 53 publications
(52 reference statements)
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“…In this respect, the drawback of low solubility of a magnetic element can be overcome by non-equilibrium growth techniques, such as Pulsed Laser Deposition (PLD) [1,[14][15][16]. In addition, thin films grown by PLD exhibit higher performances and better structural characteristics compared to other equilibrium deposition techniques [17][18][19].…”
Section: Introductionmentioning
confidence: 99%
“…In this respect, the drawback of low solubility of a magnetic element can be overcome by non-equilibrium growth techniques, such as Pulsed Laser Deposition (PLD) [1,[14][15][16]. In addition, thin films grown by PLD exhibit higher performances and better structural characteristics compared to other equilibrium deposition techniques [17][18][19].…”
Section: Introductionmentioning
confidence: 99%
“…If the expansion kinetics of those clusters is much faster than the coalescence, the growth is kinetically frozen 18 and pores form within a percolating network of elongated grains, see Fig. 2(b).…”
Section: Temperature Domainmentioning
confidence: 99%
“…For physical vapour deposition (PVD) technologies, this control is conventionally achieved by manipulating interdependent parameters, such as temperature, atmosphere, flux of material, resultant film thickness [1][2][3][4][5][6] and laser frequency [6][7][8][9][10] . In particular, the laser frequency for pulsed-based deposition (PLD) influences the film structure in many different ways, whose mechanisms can be contentious and not easily understood [7][8][9][10][11] . Thus, this interdependency is not trivial, impeding reproducibility and requiring sophisticated control with the help of, for example, reflection high-energy electron diffraction (RHEED) technique.…”
Section: Introductionmentioning
confidence: 99%