2007
DOI: 10.1016/j.ultramic.2007.02.014
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Field emission studies of pulsed laser deposited films on W and Re

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Cited by 57 publications
(22 citation statements)
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“…From Table , it is concluded that patterned BNWs have a turn‐on field of 4.3 V/μm (at 10 μA/cm 2 emission current density) and a threshold field of 10.4 V/μm (at 1 mA/cm 2 emission current density), which are comparable to many excellent cathode nanomaterials (ZnO nanowires, WO 3 nanowires and AlN nanowires etc.) except the CNTs, graphene and LaB 6 materials with very excellent FE properties . And they have better FE performance than the boron nanowires produced by other methods, as seen from Table .…”
Section: Electrical Conductivity and Field Emission Properties Of Indmentioning
confidence: 86%
“…From Table , it is concluded that patterned BNWs have a turn‐on field of 4.3 V/μm (at 10 μA/cm 2 emission current density) and a threshold field of 10.4 V/μm (at 1 mA/cm 2 emission current density), which are comparable to many excellent cathode nanomaterials (ZnO nanowires, WO 3 nanowires and AlN nanowires etc.) except the CNTs, graphene and LaB 6 materials with very excellent FE properties . And they have better FE performance than the boron nanowires produced by other methods, as seen from Table .…”
Section: Electrical Conductivity and Field Emission Properties Of Indmentioning
confidence: 86%
“…Rare‐earth hexaboride (REB 6 ) nanostructures are ideal materials for FE application as an electrical field‐induced ion and electron point source due to their miniature dimensions, low work functions, as well as excellent electrical, thermal, and mechanical properties . The advantages of using REB 6 as a FE candidate originate from their crystal structure, in which the rare‐earth metal atom is embedded inside a stable boron octahedral network.…”
Section: Introductionmentioning
confidence: 99%
“…Since the interest in using LaB 6 in cold cathodes is on the rise in recent years, there have been some attempts to prepare LaB 6 nanowires via chemical vapor deposition [18], LaB 6 polycrystalline thin films via sputtering [19,20], e-beam evaporation [21], and pulsed laser deposition (PLD) [16,[22][23][24], and LaB 6 epitaxial thin films via e-beam evaporation [25]. Previously, we investigated the epitaxial growth of functional LaB 6 and SrB 6 thin films on ultrasmooth sapphire (a-Al 2 O 3 single crystal) (0 0 0 1) substrates [26][27][28].…”
Section: Introductionmentioning
confidence: 99%