1995
DOI: 10.1016/0022-3093(94)00506-0
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Field-emission microscopy of amorphous CoSi alloy

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Cited by 27 publications
(9 citation statements)
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“…The strength region below 7.44 GPa corresponds to static mechanical testing. Relatively low electric fields of evaporation are realized due to the presence of the chemically active gas in the He-H 2 imaging mixture [19]. The hydrogen promoted reduction of the evaporation field of the BMG nanotips ensured a substantial drop in the field-induced stresses during high-field testing from 7.44 to 5.11 GPa.…”
Section: Resultsmentioning
confidence: 99%
“…The strength region below 7.44 GPa corresponds to static mechanical testing. Relatively low electric fields of evaporation are realized due to the presence of the chemically active gas in the He-H 2 imaging mixture [19]. The hydrogen promoted reduction of the evaporation field of the BMG nanotips ensured a substantial drop in the field-induced stresses during high-field testing from 7.44 to 5.11 GPa.…”
Section: Resultsmentioning
confidence: 99%
“…This value is rather higher than that generally determined by the FIM method of field etching [6,19]. Obviously, one of the reasons for this difference may be relatively low lateral resolution of the FEM in the electron mode.…”
Section: Resultsmentioning
confidence: 61%
“…Polycluster structure of MGs of different compositions was revealed by means of high resolution field emission microscopy [3,10,11]. Recently the polycluster structure of Zr 52.5 Ti 5 Cu 17.9 Ni 14.6 Al 10 bulk MG was observed by this method as well [12].…”
Section: Discussionmentioning
confidence: 99%