2020
DOI: 10.1021/acsaelm.0c00036
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Field-Effect Transistor Figures of Merit for Vapor–Liquid–Solid-Grown Ge1-xSnx (x = 0.03–0.09) Nanowire Devices

Abstract: Ge1‑x Sn x alloys form a heterogeneous material system with high potential for applications in both optoelectronic and high-speed electronics devices. The attractiveness of Ge1‑x Sn x lies in the ability to tune the semiconductor band gap and electronic properties as a function of Sn concentration. Advances in Ge1‑x Sn x material synthesis have raised expectations recently, but there are considerable problems in terms of device demonstration. Although Ge1‑x Sn x thin films have been previously explored exp… Show more

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Cited by 14 publications
(24 citation statements)
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References 57 publications
(87 reference statements)
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“…Firstly, SnI 4 was reduced by NaBH 4 at 300°C to form nanoscale molten spherical tin droplets. Then Ge(Ph) 3 Cl was reduced to form Ge 0 . Ge 0 attached on the surface of tin droplets where it could either diffuse around the outer surface of the droplet or penetrate and dissolve within it.…”
Section: Resultsmentioning
confidence: 99%
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“…Firstly, SnI 4 was reduced by NaBH 4 at 300°C to form nanoscale molten spherical tin droplets. Then Ge(Ph) 3 Cl was reduced to form Ge 0 . Ge 0 attached on the surface of tin droplets where it could either diffuse around the outer surface of the droplet or penetrate and dissolve within it.…”
Section: Resultsmentioning
confidence: 99%
“…In summary, we have demonstrated a facile one-pot two-step synthesis of high aspect ratio Ge 1−x Sn x nanowires with an average diameter of 60±20 nm and average length of 5.5±2.0 μm. The nanowires were produced via self-catalyzed SLS growth in a process using low-cost commercially available precursors, namely Ge(Ph) 3 Cl, SnI 4 and NaBH 4 . Elemental analysis revealed highly homogeneous incorporation of Sn in the Ge matrix at up to 10 at%, as evidenced by results from both XRD and EDX spot analysis.…”
Section: Resultsmentioning
confidence: 99%
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