2018
DOI: 10.1021/acsami.7b17482
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Ferroelectricity in Hf0.5Zr0.5O2 Thin Films: A Microscopic Study of the Polarization Switching Phenomenon and Field-Induced Phase Transformations

Abstract: Because of their full compatibility with the modern Si-based technology, the HfO-based ferroelectric films have recently emerged as viable candidates for application in nonvolatile memory devices. However, despite significant efforts, the mechanism of the polarization switching in this material is still under debate. In this work, we elucidate the microscopic nature of the polarization switching process in functional HfZrO-based ferroelectric capacitors during its operation. In particular, the static domain st… Show more

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Cited by 63 publications
(76 citation statements)
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“…A strong electric field induces structural change in hafnia‐based thin films. Indeed, the transition from m‐ and t‐ to o‐phase was observed by different research groups, [ 22,23 ] which increases P r in HfO 2 ‐based ferroelectrics. Moreover, the oxygen vacancy diffusion into different regions changes the relative stability of polymorphs and consequently causes phase transition.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…A strong electric field induces structural change in hafnia‐based thin films. Indeed, the transition from m‐ and t‐ to o‐phase was observed by different research groups, [ 22,23 ] which increases P r in HfO 2 ‐based ferroelectrics. Moreover, the oxygen vacancy diffusion into different regions changes the relative stability of polymorphs and consequently causes phase transition.…”
Section: Resultsmentioning
confidence: 99%
“…Another mechanism which is responsible for wake‐up effect is the structural transition from nonferroelectric (m or t) to ferroelectric (o) phase driven by a strong electric field. [ 22,23 ] Therefore, the wake‐up effect can be substantially reduced by the reduction of m‐ and t‐phase during thin‐film processing. [ 24 ] Goh et al [ 25 ] evaluated the effect of metal oxide (as an electrode) on the wake‐up behavior of the Hf 0.5 Zr 0.5 O 2 (HZO) film and they observed an improve in wake‐up behavior which could be due to the suppression of oxygen vacancy at the interfacial region.…”
Section: Introductionmentioning
confidence: 99%
“…For conventional ferroelectrics, there are techniques for verifying the ferroelectric origin of hysteretic response of the capacitor relying on the comparison of field-on (also called DC-on) and field-off hysteresis loops 23,25 . Recently, PFM study of domain dynamics in 10nm HZO in the capacitor geometry had been carried out 26 , however, no in-depth analysis of the field-on/off loops is available so far.…”
mentioning
confidence: 99%
“…In this scenario, the probe being a non-blocking contact, a strong interaction of oxygen vacancies with the environment should be expected for the presence of water and oxygen radicals. Therefore, with the objective of tracking dynamic domain evolution, or operando analysis over hundreds of cycles, a passive BE-PFM analysis in the presence of a thin top electrode is likely to be more recommended, as recently reported by Chouprik and co-workers [35].…”
Section: Tip-induced Polarization and Multi-domain Structurementioning
confidence: 88%
“…In agreement with previous reports on the limitations of PFM for the analysis of thin films, this indicates that our attempts to use PFM in ultrathin doped-HfO 2 are affected by severe electrostatic parasitic, with the response likely dominated by cantilever motion arising from long range electrostatics [32][33][34]. It must be noted that the applied polarization is a static dc stress applied by the probe, thus representing a different stress condition compared to what is commonly associated with the increase in volume fraction of orthorhombic phase by field-induced conversion or domain de-pinning [35].…”
Section: Tip-induced Polarization and Multi-domain Structurementioning
confidence: 97%