Ferroelectric Thick Film in Insulator Sleeve on a Low Energy Plasma Focus

Abstract

ferroelectric ceramic the electron emission could be enhanced in order to optimize current sheath formation of The effect of ferroelectric lead germanate a plasma focus system. Pb5Ge3O11 thick film in the alumina insulator sleeveThe nice initial formation and hind evolution of the of a 400 Joules Mather-type plasma focus device is current sheath on the insulator surface is required for an studied. The breakdown phase along the insulator is efficient plasma in a Z-Pinch structure. Under this fundamental for the formation of a homogeneous and conditions, for an initial formation of the current sheath, is symmetric current sheath. For over several hundreds important a symmetric generation of the electron electrical discharges, the different films show good avalanche and free of multiple channel surface flashover. mechanical and electric performance. From the Some of the new ferroelectric materials, with special beginning, the drive system operation is highly physical conditions in order to enhance the electron reproducible, shot to shot, with a clear definition of emission, differs from the conventional electron emitters the plasma pinch on the axis of discharge. The (photoelectronic, thermionic, field emitters, etc.). The influence grade of the electron emission from ferroelectric electron emission can be excited under ferroelectric is experimentally studied. external perturbations like flashover voltage. The FEE effect is observed in many ferroelectric ceramics specially in the commercial ones like the PZT and PLZT. In our