2019
DOI: 10.1063/1.5125809
|View full text |Cite
|
Sign up to set email alerts
|

Ferroelectric properties of ion-irradiated bismuth ferrite layers grown via molecular-beam epitaxy

Abstract: We systematically investigate the role of defects, introduced by varying synthesis conditions and by carrying out ion irradiation treatments, on the structural and ferroelectric properties of commensurately strained bismuth ferrite BixFe2−xO3 layers grown on SrRuO3-coated DyScO3(110)o substrates using adsorption-controlled ozone molecular-beam epitaxy. Our findings highlight ion irradiation as an effective approach for reducing through-layer electrical leakage, a necessary condition for the development of reli… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
9
0

Year Published

2020
2020
2023
2023

Publication Types

Select...
4
3

Relationship

3
4

Authors

Journals

citations
Cited by 10 publications
(9 citation statements)
references
References 44 publications
0
9
0
Order By: Relevance
“…It is well known that BiFeO 3 is susceptible to defects, which can lead to a leakage current under an applied bias. To minimize the parasitic leakage current, we performed ferroelectric hysteresis loops both at low temperatures and at room temperature after ion bombardment of the sample ( 73 , 74 ), which has previously been shown to substantially reduce the leakage current. Bombardment was performed at Lawrence Berkeley National Laboratory using the Pellatron facility to iridate with a He 2+ ion dose of 1.3 × 10 16 /cm 2 .…”
Section: Methodsmentioning
confidence: 99%
“…It is well known that BiFeO 3 is susceptible to defects, which can lead to a leakage current under an applied bias. To minimize the parasitic leakage current, we performed ferroelectric hysteresis loops both at low temperatures and at room temperature after ion bombardment of the sample ( 73 , 74 ), which has previously been shown to substantially reduce the leakage current. Bombardment was performed at Lawrence Berkeley National Laboratory using the Pellatron facility to iridate with a He 2+ ion dose of 1.3 × 10 16 /cm 2 .…”
Section: Methodsmentioning
confidence: 99%
“…Defects are, in general, thought to be deleterious to (relaxor) ferroelectrics and are blamed for high leakage currents, aging, and other negative effects (14). Recent studies have shown that defects produced by ion bombardment with high-kinetic energy species can be used to create favorable intrinsic point defects and complexes (e.g., defect dipoles), which can improve ferroelectric/electrical properties or even create novel function (15)(16)(17)(18)(19)(20)(21)(22)(23)(24)(25). Both point defects and defect dipoles or complexes can interact with free charge, producing deep-level trap states, or with polarization (biasing, pinning domain walls, etc.)…”
mentioning
confidence: 99%
“…This could be a key enabling processing approach as we push to integrate such materials into increasing complex device structures that might limit growth to nonideal conditions. In addition to reducing leakage current, which is (of course) favorable for many applications, such defects can also serve as pinning sites for domain walls, [182,194,195] and can lead to an increase in the coercive field which is typically less desirable for applications relying on traditional bipolar switching of a ferroelectric. As understanding of how these ion beams can control ferroelectric properties grew, researchers have now been able to utilize these features which were once considered only deleterious to ferroelectric properties to produce novel functionality.…”
Section: Defect Engineeringmentioning
confidence: 99%
“…The result is controlled defect densities and profiles that leverage the mature field of ion-induced damage in materials. Ion bombardment of BiFeO 3 and PbTiO 3 (Figure 7d) films, deposited by either PLD [182,184] or MBE [194] has been found to create defect complexes and clusters which can reduce the free-carrier transport via the formation of deep trap states in the bandgap. What this means is that it is now possible to "fix" deficient properties in a material after the fact (i.e., after it is grown).…”
Section: Defect Engineeringmentioning
confidence: 99%