Abstract:As the patterns are getting smaller, the difficulty to control a margin-tight process expands exponentially. The use of the Automated Process Control (APC), therefore, becomes a widely employed mean in photolithography process to control overlay and CD variations. The accuracy of APC is dependent upon the amount of the previous process data. However, in a foundry with high-mix products it is typical that there are not enough historic data points for accurate calculation of process parameters for a low volume p… Show more
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