Features of how the parameters of an induction-capacitance device affects the nickel plating process

Peculiarities of chromium deposition with application of an induction-capacitance device

“…Thus, the power supply type exerts a significant influence on the alternating component spectrum and the optimum values of the device parameters. This is also confirmed by experiments with application of a single-phase power supply, wherein the optimum inductance value exceeded the values used in the present tests by dozens of times [2,3].…”

“…3,4). In the case of the bath substitution by equivalent active resistance with an identical voltage drop ( U = 4.1 V), the highest values of the alternating current component amplitude were observed in the range of 0-1 kHz (Fig.…”

“…As was mentioned in previous works, in order to influence the deposition process and the properties of electrodeposited coatings, special inductance-capacitance devices ( LC devices) may be applied that are embedded or connected in series to power supplies utilized in the electroplating industry, since the variation of the parameters of these devices influences the cathode polarization and the deposit structure [2][3][4]. The variation of these parameters in the power supply-bath circuit results in changes of the amplitude and frequency of the alternating current components.…”

“…Influence of the current density on the chromium power yield (1, 2) and the deposition rate(3,4) under the following deposition conditions:(1, 3)without the LC device connection;(2,4) with the LC device (L = 0.119 mH, C = 0.024 F).…”