Fe(CO) 5 is one of the most common precursors used in focused electron beam induced deposition (FEBID). Since high-energy electrons interacting with matter produce large amounts of secondary electrons with energies <50 eV, those generated within the substrate in FEBID are expected to play a major role in the dissociation process of the precursor molecules. The aim of this study is to identify the role of the secondary electrons in the deposition process of Fe(CO) 5 and the relevant dissociation mechanisms, using an electron stimulated desorption system with 4−33 eV electrons. The desorption of charged fragments from thin films of Fe(CO) 5 , condensed on Xe or onto a Pt foil, was measured as a function of incident electron energy, incident current, and thickness of both Fe(CO) 5 and Xe films. Both dissociative electron attachment (DEA) and dipolar dissociation (DD) are involved in the production of anions, specifically, C − and O − , and Fe(CO) x − (x = 0−4). Cations C + , O + , CO + , and Fe(CO) x + (x = 0−4) were detected with desorption thresholds in the ∼15−25 eV range. These fragments are produced via direct dissociative processes. This study reveals the detailed dissociation mechanisms of Fe(CO) 5 induced by low-energy electron impact by the direct observation of Fe(CO) x fragments under different conditions, thus confirming the frequently proposed mechanisms of deposition of Fe by FEBID.