Digital color imaging relies on spectral filters on top of a pixelated sensor, such as a CMOS image sensor. An important parameter of imaging devices is their resolution, which depends on the size of the pixels. For many applications, a high resolution is desirable, consequently requiring small spectral filters. Dielectric nanostructures, due to their resonant behavior and its tunability, offer the possibility to be assembled into flexible and miniature spectral filters, which could potentially replace conventional pigmented and dye-based color filters. In this paper, we demonstrate the generation of transmissive structural colors based on uniform-height amorphous silicon nanostructures. We optimize the structures for the primary RGB colors and report the construction of sub-micrometer RGB filter arrays for a pixel size down to 0.5 μm.In the past decades we have observed a rapid growth of the spatial resolution of color imaging devices 1-8 . This technological outburst was mainly driven by daily-use hand-held devices, such as mobile phones and compact optical cameras, but a high resolution also serves a role in industrial and environmental imaging 9 . The use of complementary metal-oxide-semiconductor (CMOS) image sensor with pigmented and dye-based color filters allowed to obtain pixels as small