Fast single-step fabrication of nanopores

Chen, P.; Wu, Mingjie; Salemink, H.W.M.; Alkemade, P.F.A.

doi:10.1088/0957-4484/20/1/015302

Cited by 14 publications

(13 citation statements)

References 33 publications

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“…Recent advancements in nanofabrication techniques allow artificial solid-state nanopores to be fabricated in Si 3 N 4 , SiO 2 , Si, and alumina [2,6,12,13,14,15,16,17,18,19,20,21,22,23,24,25]. These nanopore devices uncover many advantages, such as the ability to control a pore diameter, increased mechanical strength, and integration with micro/nano-devices.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Solid State Nanopore in Thin Silicon Membrane Using Low Cost Multistep Chemical Etching

Khan

Williams

2015

Materials

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Nanopore-based analysis is currently an area of great interest in many disciplines with the potential for exceptionally versatile applications in medicine. This work presents a novel step towards fabrication of a single solid-state nanopore (SSSN) in a thin silicon membrane. Silicon nanopores are realized using multistep processes on both sides of n-type silicon-on-insulator (SOI) <100> wafer with resistivity 1–4 Ω·cm. An electrochemical HF etch with low current density (0.47 mA/cm2) is employed to produce SSSN. Blue LED is considered to emit light in a narrow band region which facilitates the etching procedure in a unilateral direction. This helps in production of straight nanopores in n-type Si. Additionally, a variety of pore diameters are demonstrated using different HF concentrations. Atomic force microscopy is used to demonstrate the surface morphology of the fabricated pores in non-contact mode. Pore edges exhibit a pronounced rounded shape and can offer high stability to fluidic artificial lipid bilayer to study membrane proteins. Electrochemically-fabricated SSSN has excellent smoothness and potential applications in diagnostics and pharmaceutical research on transmembrane proteins and label free detection.

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Section: Introductionmentioning

confidence: 99%

Fabrication of Solid State Nanopore in Thin Silicon Membrane Using Low Cost Multistep Chemical Etching

Khan

Williams

2015

Materials

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“…A thinning mechanism that can be integrated seamlessly with an established nanopore fabrication technique would be ideal for rapid and arbitrary device preparation. While several approaches [30–36] exist for nanopore fabrication, milling with the focused beam of a scanning helium ion microscope (HIM) has been demonstrated as a uniquely effective approach to both form SS-nanopores [37] and to reduce the thickness of a suspended solid-state membrane controllably [38]. However, the effect of varying membrane thickness on the rate of He + ion-facilitated nanopore expansion has so far not been studied.…”

Section: Introductionmentioning

confidence: 99%

Membrane Thickness Dependence of Nanopore Formation with a Focused Helium Ion Beam

Sawafta

Carlsen

Hall

2014

Sensors

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Solid-state nanopores are emerging as a valuable tool for the detection and characterization of individual biomolecules. Central to their success is the realization of fabrication strategies that are both rapid and flexible in their ability to achieve diverse device dimensions. In this paper, we demonstrate the membrane thickness dependence of solid-state nanopore formation with a focused helium ion beam. We vary membrane thickness in situ and show that the rate of pore expansion follows a reproducible trend under all investigated membrane conditions. We show that this trend shifts to lower ion dose for thin membranes in a manner that can be described quantitatively, allowing devices of arbitrary dimension to be realized. Finally, we demonstrate that thin, small-diameter nanopores formed with our approach can be utilized for high signal-to-noise ratio resistive pulse sensing of DNA.

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“…The Pt-dot array was deposited under FIB conditions of t d ¼ 40 ms/dot and N s ¼ 1 in the spot drawing mode. 21 Therefore, Pt was deposited in the concave nanoholes generated by FIB sputtering at almost the same time as the nanohole was produced. In contrast, Fig.…”

Section: Resultsmentioning

confidence: 99%

Fabrication of nanodot array mold with 2 Tdot/in.2 for nanoimprint using metallic glass

Fukuda

Saotome

Nishiyama

et al. 2012

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Interrelationship between the shear modulus of a metallic glass, concentration of frozen-in defects, and shear modulus of the parent crystal Appl. Phys. Lett. 102, 091908 (2013); 10.1063/1.4794987On the nature of enthalpy relaxation below and above the glass transition of metallic glassesHere, the authors fabricated a mold consisting of nanodot arrays with an 18-nm pitch and performed nanoimprinting of metallic glass for developing bitpatterned media (BPM) with an areal recording density of 2 Tbit/in. 2 . Specifically, they investigated the feasibility of SiO 2 /Si mold fabrication by metal mask patterning with focused ion beam assisted chemical vapor deposition (FIB-CVD) and reactive ion etching (RIE). SiO 2 was etched with a mixed gas of CHF 3 and O 2 , resulting in successful fabrication of convex nanodot arrays with an 18-nm pitch. The authors attempted nanoimprinting of Pd-based metallic glass with the fabricated SiO 2 mold and clearly confirmed the replication of the fine nanohole pattern. These results suggest that the proposed FIB-CVD and RIE process is a promising method for fabricating ultrafine nanodot arrays and that metallic glasses are excellent nanoimprintable materials for mass-produced nanodevices such as BPM with ultrahigh recording density.

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Fast single-step fabrication of nanopores

Cited by 14 publications

References 33 publications

Fabrication of Solid State Nanopore in Thin Silicon Membrane Using Low Cost Multistep Chemical Etching

Fabrication of Solid State Nanopore in Thin Silicon Membrane Using Low Cost Multistep Chemical Etching

Membrane Thickness Dependence of Nanopore Formation with a Focused Helium Ion Beam

Fabrication of nanodot array mold with 2 Tdot/in.2 for nanoimprint using metallic glass

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