2008
DOI: 10.1134/s1063782608110237
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Fast optical recording media based on semiconductor nanostructures for image recording and processing

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(2 citation statements)
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“…To date, as high-speed optical recording media, there have been proposed media based on MIS structures with a thin nanoscale layer of thallium dielectric (Tl) with a thickness of 2-5 nm, (M(Tl)S-nanostructure) [12], where a b high-resistance cadmium telluride (CdTe) with a resistivity of 10 7 -10 8 Ohmcm (Fig. 3a) is used as a semiconductor element.…”
Section: Resolution Of Optical Recording Passivated Working Elements In Sem-iconductor Cd1 -Xznxte Nanostruc-turesmentioning
confidence: 99%
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“…To date, as high-speed optical recording media, there have been proposed media based on MIS structures with a thin nanoscale layer of thallium dielectric (Tl) with a thickness of 2-5 nm, (M(Tl)S-nanostructure) [12], where a b high-resistance cadmium telluride (CdTe) with a resistivity of 10 7 -10 8 Ohmcm (Fig. 3a) is used as a semiconductor element.…”
Section: Resolution Of Optical Recording Passivated Working Elements In Sem-iconductor Cd1 -Xznxte Nanostruc-turesmentioning
confidence: 99%
“…The charge Q formed in the crystal by quanta of absorbing reading light and collected on the electrodes due to the passage of the charge q(z) is determined from the expression [12]  …”
Section: Resolution Of Optical Recording Passivated Working Elements In Sem-iconductor Cd1 -Xznxte Nanostruc-turesmentioning
confidence: 99%