We report and demonstrate a new method to fabricate single fluidic-channels of uniform channel width (11−50 nm) and over 1.5 cm in length, which are essential to developing innovative bio/chemical sensors but have not been fabricated previously. The method uses unconventional nanofabrication (a combination of crystallographic anisotropic etching, conformal coating, and edge patterning, etc.) to create an imprint mold of a channel pattern and nanoimprint to duplicate such channel. The centimeter-long channel continuity is verified by flowing fluorescent dye-stained water and stretching and transporting DNAs. The 18 by 20 nm channel cross-section was confirmed by measuring the liquid conductance in the channel.One critical challenge in developing many innovative bio/ chemical sensors is the fabrication of a single narrow yet long (centimeter) and continuous fluidic channel at the precisely designated location. 1-7 Such channels of a sub-20 nm width, essential for device function, were hardly fabricated previously because of the intrinsic limitations in the fabrication methods used, particularly the traditional nanofabricationmethods(e.g.,writingandetchingnanostructures). [8][9][10] For example, to explore a new real-time DNA-sequencing device (potentially revolutionary if successful), it requires not only a continuous fluidic channel of a width below 20 nm and a length of a centimeter for stretching and stabilizing DNAs, but also a single channel host for putting electrical or optical sensors inside the channel. 4,5,7,[11][12][13][14][15] Multiple channels will greatly complicate the sensor fabrication and the addressable detection of single DNA. 15,16 These requirements make the fabrication of a single sub-20 nm wide, centimeter-long, continuous fluidic channel extremely challenging due to two main reasons. (a) All scanning nanostructure-writing tools, such as electron beam lithography, ion beam lithography, or scanning probe patterning are limited to a writing field of ∼100 µm for sub-20 nm structures, which is not sufficient for the needed long channel. Stitching of different fields does not have the necessary accuracy to connect two channels into a single continuous channel. All the nanostructure-writing tools based on a fixed writing beam (probe) and a moving stage can barely maintain sub-20 nm writing over centimeter distances. (b) Because of the noise in these writing tools and reactive ion etching (if used), the line-edge-roughness (LER), which has an average size of 5-50 nm, will clog the channel before the average channel width is reduced to 20 nm, because just one large edge variation (far larger than average) can clog the long channel. Interference lithography can make narrow continuous fluidic-channels over centimeter lengths but it usually makes dense, multiple channels rather than a single channel, 15 and it also suffers LER as nanostructure writing tools, preventing a small needed channel width (in principle, a single channel line may be produced by interference lithography under special co...