Fast deposition of plasma polymer layers

Abstract

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Characteristic quantities of a cascade arc used as a light source for spectroscopic techniques

“…In our spectroscopic ellipsometer an extension to 8.5 pm has been achieved and with a change of a few optical components the wavelength region from 200 nm to 8.5 pm can be covered. Measurements have been performed on thin films of amorphous carbon, amorphous silicon and carbon based polymers (Beulens et al 1989, 1990, Wilbers et al 1990b. In the IR interferometer used by Haverlag et al (1989) at the same institute, an improvement of a factor of 20-200 (wavelength dependent) in signal-to-noise ratio is obtained.…”

Influence of the addition of CF4 on the deposition of a-C:H layers using the expanding thermal plasma technique

“…The exit of the arc (called the nozzle) is grounded. Other details can be found elsewhere [6,7]. The Ar gas in the arc is ionized, giving a plasma at a pressure of 0.5 bar.…”

Fast Plasma Deposition of Carbon and Silicon Layers

“…With this technique amorphous (a-C:H) and crystalline carbon (diamond and graphite) films have been grown [1,2]. By in situ ellipsometry the growth rate, and also the refractive index and thickness, are measured.…”