Fast and efficient electrochemical thinning of ultra-large supported and free-standing MoS₂ layers on gold surfaces

Abstract

Molybdenum disulfide (MoS2) is a very promising layered material for electrical, optical, and electrochemical applications because of its unique and outstanding properties. To unlock its full potential, among different preparation...

Patterning edge-like defects and tuning defective areas on the basal plane of ultra-large MoS2 monolayers toward the hydrogen evolution reaction

“…Next, ten cyclic voltammetric cycles from −0.1 to 0.5 V at 10 mV s −1 were performed in 0.5 M H 2 SO 4 , as reported. 33 Before assessing the electrocatalytic response the microelectrodes were cycled until a reproducible curve was attained. HER polarization curves were obtained at 5 mV s −1 in a 0.5 M H 2 SO 4 solution using the electrodes described above.…”

“…The micromeshes were prepared through photolithography and electrodeposition processes as reported. 33,34 The microfabricated micromesh is 40 mm thick and contains holes of 20 mm in diameter. The transfer process using sucrose was the same as described above on glass:Au electrodes, but additional cleaning steps were added, as follows.…”

“…Large MoS 2 monolayers were prepared directly on the substrates using a simple and fast method. 33 Next, gallium-FIB was used to etch MoS 2 and open reactive windows on the basal plane. The dose applied to etch a controlled depth on MoS 2 was calibrated using atomic force microscopy (AFM).…”

Interaction Modification of Transition Metal Dichalcogenide Layers by Halogenation

“…In this context, the development of techniques aiming at controlling the number of layers composing the TMD stack were proposed . Halogenation was extensively used for this purpose.…”

“…15 In this context, the development of techniques aiming at controlling the number of layers composing the TMD stack were proposed. 16 Halogenation was extensively used for this purpose. Atomic layer etching (ALE) with Cl adsorption successfully removed the upper layer of MoS 2 , without damaging the resulting monolayer.…”