Proceedings of 2002 IEEE 14th International Conference on Dielectric Liquids. ICDL 2002 (Cat. No.02CH37319)
DOI: 10.1109/icdl.2002.1022718
|View full text |Cite
|
Sign up to set email alerts
|

Factors contributing to streamer morphology

Abstract: Recent work shows that the range of morphology of anode streamers in liquid dielectric breakdown is predicted when it is represented as stochastic growth of a branching fractal tree. This model may be analogous to the critical volume model of breakdown used in gases. Assuming there is a relationship, leads to a concept of how affecting the electron production and recombination rates in a fluid can affect streamer behavior. These concepts were tested by measuring the effect on streamer behavior due to adding a … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

1
1
0

Publication Types

Select...
1
1

Relationship

1
1

Authors

Journals

citations
Cited by 2 publications
(2 citation statements)
references
References 15 publications
1
1
0
Order By: Relevance
“…Moreover, the predicted behavior is that as the electric field is reduced and/or the electron density is increased, the streamers become bushier. This is consistent with experimental observations in streamers from point cathodes [17]. This correlation suggests that the model may be equally valid for anode and cathode streamers.…”
Section: Discussionsupporting
confidence: 81%
“…Moreover, the predicted behavior is that as the electric field is reduced and/or the electron density is increased, the streamers become bushier. This is consistent with experimental observations in streamers from point cathodes [17]. This correlation suggests that the model may be equally valid for anode and cathode streamers.…”
Section: Discussionsupporting
confidence: 81%
“…The third set of experiments involved the addition of a chemical additive to the test liquid [10]. In these studies, the streamer initiated from a point anode.…”
Section: Experimental Backgroundmentioning
confidence: 99%