2016
DOI: 10.1021/acssuschemeng.5b01746
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Facile, Noncyanide Based Etching of Spray Deposited Cu2ZnSnS4 Thin Films for Secondary Phase Removal

Abstract: The coexistence of secondary phases in the quaternary compound kesterite Cu2ZnSnS4 (CZTS), a promising photovoltaic absorber, is a major problem while synthesizing under Zn or Cu rich conditions. A large variety of secondary phases, such as CuS, Cu1.8S, Cu2S, Cu2SnS3, and ZnS exist on the surface unless they are not removed by dedicated surface treatment before the annealing step. Under a carefully chosen concentrations of the starting precursors (usually, Zn-poor and Sn-rich) for spray pyrolyzed CZTS, the fra… Show more

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Cited by 32 publications
(6 citation statements)
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“…shows the SEM images of the CZTS samples (a) before, (b) after 30 wt.%-H 2 O 2 surface treatment dipped in 150 s at 293 K, (c) after 3 wt.%-H 2 O 2 surface treatment dipped in 150 s at 293 K and (d) after 3 wt.%-H 2 O 2 surface treatment in 150 s at 333 K. The surface morphology of the sample dipped in concentrated H 2 O 2 solution at long time is drastically changed compared with untreated sample surface.This morphology is similar to Ref [9]…”
supporting
confidence: 90%
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“…shows the SEM images of the CZTS samples (a) before, (b) after 30 wt.%-H 2 O 2 surface treatment dipped in 150 s at 293 K, (c) after 3 wt.%-H 2 O 2 surface treatment dipped in 150 s at 293 K and (d) after 3 wt.%-H 2 O 2 surface treatment in 150 s at 333 K. The surface morphology of the sample dipped in concentrated H 2 O 2 solution at long time is drastically changed compared with untreated sample surface.This morphology is similar to Ref [9]…”
supporting
confidence: 90%
“…Wet etching is divided into the following three processes; transport or diffusion of reactants to the surface, [9]. However, their CZTS films prepared by spray pyrolysis and H 2 O 2 surface treatment is sprayed on the CZTS surface.…”
mentioning
confidence: 99%
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“…The aformentioned discussion strongly validates that KCN-etching is a promising approach for removing unwanted secondary phases in CZTS films, but this treatment can instead lead to unwanted voids in a resulting film. [192,193] Therefore, apart from the KCN etching for the removal of Cu x S, Chavda et al [194] applied H 2 O 2 and HCl etching, and comparatively investigated their impacts. They reported that in contrast to conventional HCl etching, the H 2 O 2 etching proved more effective in the removal of Cu x S and related impurity phases from the CZTS deposited by spray pyrolysis.…”
Section: Secondary Phases Removal Strategiesmentioning
confidence: 99%
“…[123] In addition, Pinto et al reported the Cu 2−x (S,Se) secondary phase can be removed completely by a safer chemical mixture of ethylenediamine and 2-mercaptoethanol. [124] It is indicated that H 2 O 2 can also effectively remove Cu x S phases following by [125] Cu…”
Section: Etching Of Secondary Phasesmentioning
confidence: 99%