To
achieve facile fabrication of a flexible patterned film via
electrohydrodynamic patterning (EHDP), a semiconducting photocurable
resin (SCPR) was developed based on an optimized designed hyperbranched
polymer and a photocurable monomer. It showed a low interface tension
(34.185 mN/m), low viscosity (9.21 mPa·s), high dielectric constant
(27.6), suitable conductivity (1.63 × 10–5 S/cm),
favorable wettability (a contact angle of 19.3°), and film-forming
property on an ITO-coated substrate. Benefitting from its excellent
properties, a flexible patterned film with diverse micro-/nanostructures,
including high-aspect ratio and/or small-feature-size pillar arrays,
curvature-controllable aspheric microlens arrays, and hierarchical
ordered pillar/pillar arrays, was rapidly manufactured via EHDP. Moreover,
the characteristic wavelength decreased with the increasing applied
voltage, decreasing electrode spacing, and increasing liquid film
thickness, which was perfectly in accord with the leaky dielectric
model of EHDP. This research provides an effective strategy for rapidly
manufacturing a flexible patterned film with diverse micro-/nanostructures.